公开(公告)号：US20150167705A1

公开(公告)日：2015-06-18

申请号：US14463166

申请日：2014-08-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SOYOUNG LEE ,  SUHO LEE ,  CHANG-YUN LEE ,  IKSOO KIM ,  JUHYUN LEE ,  JONGWON HONG

IPC: F15D1/00 ,  H01J37/32 ,  C23C16/50 ,  C23C16/455

CPC classification number: H01J37/32449 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/45589 ,  C23C16/45591 ,  C23C16/50 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32807

Abstract: A substrate treating apparatus includes a chamber that encloses an internal space; a susceptor in a lower part of the internal space; a shower head in an upper part of the internal space and spaced above the susceptor and that includes a plurality of distribution holes; and a blocker plate assembly that comprises a body having a plurality of intake holes that divides a space between a top wall of the chamber and the shower head into an upper intake space and a lower distribution space, a ring-shaped partition rib on an upper surface of the body, and a ring-shaped distribution unit on a lower surface of the body.

Abstract translation: 基板处理装置包括封闭内部空间的室; 在内部空间的下部的基座; 位于所述内部空间的上部并且在所述基座上方间隔并包括多个分配孔的淋浴喷头; 以及阻挡板组件，其包括具有多个进气孔的主体，所述多个进气孔将所述腔室的顶壁和所述喷淋头之间的空间分成上进气空间和下分配空间，上部的环形分隔肋 身体的表面，以及在身体的下表面上的环形分配单元。