公开(公告)号：US20240192604A1

公开(公告)日：2024-06-13

申请号：US18216028

申请日：2023-06-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehong LIM ,  Youngho HWANG ,  Byungjo KIM ,  Sangki NAM ,  Suyoung YOO ,  Sanghyun LIM ,  Youngkyun IM ,  Hyungkyu CHOI ,  Seok HEO

IPC: G03F7/40

CPC classification number: G03F7/40

Abstract: A post baking apparatus comprising a baking chamber configured to receive a substrate with an exposed photoresist film, a lower heater in the baking chamber under the substrate to heat the exposed photoresist film, an applier applying an electric field or a magnetic field to the exposed photoresist film along a vertical direction, which is substantially perpendicular to an upper surface of the exposed photoresist film, to control diffusions of an acid or a secondary electron, which are generated from the exposed photoresist film, along a horizontal direction, and a controller configured to control an operation of the applier.