公开(公告)号：US20190279862A1

公开(公告)日：2019-09-12

申请号：US16292939

申请日：2019-03-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jin-wook PARK ,  Tae-jin YIM ,  Youn-joung CHO ,  Hiroshi MORITA ,  Yasuhisa FURIHATA

IPC: H01L21/02 ,  H01L21/762 ,  H01L27/108

Abstract: A method of forming an oxide layer, the method including forming a first material layer on a semiconductor substrate, the first material layer including a polysiloxane material, wherein, from among Si—H1, Si—H2, and Si—H3 bonds included in the polysiloxane material, a percentage of Si—H2 bonds ranges from about 40% to about 90%, performing a first annealing process on the first material layer in an inert atmosphere, and performing a second annealing process on the first material layer in an oxidative atmosphere.

公开(公告)号：US20230357283A1

公开(公告)日：2023-11-09

申请号：US18218206

申请日：2023-07-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yoshiaki OBANA ,  Hyeyun PARK ,  Sujin KWON ,  Shiyong YI ,  Junwon HAN ,  Hiroshi MORITA ,  Rieko HAMADA ,  Kouji IINO

IPC: C07F5/02 ,  H10K30/00 ,  H10K39/32 ,  H10K85/30 ,  H10K85/60

CPC classification number: C07F5/02 ,  C07F5/022 ,  H10K30/451 ,  H10K39/32 ,  H10K85/322 ,  H10K85/655 ,  H10K85/656 ,  H10K85/6576

Abstract: An organic compound, an organic photoelectric device, an image sensor, and an electronic device, the organic compound being represented by Chemical Formula 1:






wherein, in Chemical Formula 1, R1, R2, R3, R4, R5, and R6 are each independently a hydrogen atom, a substituted or unsubstituted C1-C4 alkyl group, a substituted or unsubstituted C1-C4 alkoxy group, or a substituted or unsubstituted C1-C4 alkylthio group, and A is a functional group including a heteroaryl group that includes at least one sulfur atom.