公开(公告)号：US20120081538A1

公开(公告)日：2012-04-05

申请号：US13242655

申请日：2011-09-23

申请人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

发明人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

IPC分类号： H04N7/18

CPC分类号： G01N21/956

摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

摘要翻译： 该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内， 自动对焦机构控制单元停止自动对焦机构。

公开(公告)号：US08049897B2

公开(公告)日：2011-11-01

申请号：US12047844

申请日：2008-03-13

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/55

CPC分类号： G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0631

摘要： A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

摘要翻译： 提供了一种掩模版缺陷检查装置，其抑制由积分器产生的发光点导致的光学部件的劣化，并且能够长期高精度地进行缺陷检查。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 该装置包括用于用检查光照射标线的照明光学系统和用于检测用检查光照射的掩模版的图案图像的检测光学系统，其中照明光学系统包括用于均衡检查的照明分布的积分器 光和移动机构，用于使积分器能够在垂直于积分器的光轴的方向上稍微移动。

公开(公告)号：US20080259328A1

公开(公告)日：2008-10-23

申请号：US12047844

申请日：2008-03-13

申请人： Ryoichi HIRANO ,  Riki Ogawa

发明人： Ryoichi HIRANO ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0631

摘要： A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

摘要翻译： 提供了一种掩模版缺陷检查装置，其抑制由积分器产生的发光点导致的光学部件的劣化，并且能够长期高精度地进行缺陷检查。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 该装置包括用于用检查光照射标线的照明光学系统和用于检测用检查光照射的掩模版的图案图像的检测光学系统，其中照明光学系统包括用于均衡检查的照明分布的积分器 光和移动机构，用于使积分器能够在垂直于积分器的光轴的方向上稍微移动。

公开(公告)号：US07894051B2

公开(公告)日：2011-02-22

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US20080259323A1

公开(公告)日：2008-10-23

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01J1/46

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US08797525B2

公开(公告)日：2014-08-05

申请号：US13608026

申请日：2012-09-10

申请人： Riki Ogawa

发明人： Riki Ogawa

IPC分类号： G01N21/956

CPC分类号： G01N21/956

摘要： A pattern inspection apparatus in accordance with one aspect of the present invention includes a laser light source configured to emit a laser light, an integrator lens configured to input the laser light, and form a light source group by dividing the laser light inputted, a scattering plate, arranged at a front side of an incident surface of the integrator lens, configured to scatter the laser light which is to enter the integrator lens, and an inspection unit configured to inspect a defect of a pattern on an inspection target object where a plurality of figure patterns are formed, by using the laser light having passed through the integrator lens as an illumination light.

摘要翻译： 根据本发明的一个方面的图案检查装置包括配置为发射激光的激光源，被配置为输入激光的积分器透镜，并且通过分割输入的激光形成光源组，散射 配置在所述积分透镜的入射面的前侧，被配置为使进入所述积分透镜的激光散射;以及检查单元，被配置为检查所述检查对象上的图案的缺陷，所述检查对象的多个 通过使用已经通过积分器透镜的激光作为照明光来形成图形图案。

公开(公告)号：US08199403B2

公开(公告)日：2012-06-12

申请号：US12404569

申请日：2009-03-16

申请人： Riki Ogawa

发明人： Riki Ogawa

IPC分类号： G02B27/28

CPC分类号： G02B27/286 ,  G01N21/21 ,  G01N21/956

摘要： A light polarization control apparatus includes a linear polarized light generation device for generating a linearly polarized light ray; and a pair of first and second four-division type half-wave plate located at front and back positions of a light axis, each said half-wave plate having a surface divided into four regions by a couple of boundary lines crossing together at right angles, wherein the linearly polarized light ray is guided to pass through said pair of first and second four-division type half-wave plate to thereby divide this light ray into eight areas each having its polarization state as converted to any one of a azimuthally polarized state and a radially polarized state.

摘要翻译： 光偏振控制装置包括用于产生线偏振光的线偏振光产生装置; 以及位于光轴的前后位置的一对第一和第二四分割型半波片，每个所述半波片具有通过直角交叉的两对边界线分成四个区域的表面 其中，所述线偏振光被引导以通过所述一对第一和第二四分割型半波片，从而将该光线分成八个具有偏振态的区域，以转换为方位极化状态 和径向极化状态。

公开(公告)号：US07911599B2

公开(公告)日：2011-03-22

申请号：US12047554

申请日：2008-03-13

申请人： Toshiyuki Watanabe ,  Riki Ogawa

发明人： Toshiyuki Watanabe ,  Riki Ogawa

IPC分类号： G01N21/00 ,  G01N21/88

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

摘要翻译： 提供了能够进行高检测灵敏度的缺陷检查的掩模版缺陷检查装置。 该装置包括用于利用第一检查光照射样品的一个表面的透射照明的光学系统，用第二检查光照射样品的另一个表面的反射照明的光学系统，以及可以同时检测的检测光学系统 通过第一检查光通过样品而获得的透射光和由第二检查光获得的反射光被样品反射。 并且透射照明的光学系统包括用于校正由样品的厚度产生的透射光的焦点偏移的聚焦透镜驱动机构。

公开(公告)号：US07760349B2

公开(公告)日：2010-07-20

申请号：US11083323

申请日：2005-03-18

申请人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

发明人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.

摘要翻译： 一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射形成有图案（6）的掩模（4）上的不同区域（14a，14b）;物镜（OL） 所述掩模和至少一对检测光学系统（15,16），每个具有检测传感器（17,19）以形成所述图案的图像并且用于通过所述物镜接收来自每个所述不同区域的照明光， 每个检测光学系统具有用于调整孔的角度的机构（18a，20a）。

公开(公告)号：US07359043B2

公开(公告)日：2008-04-15

申请号：US10743830

申请日：2003-12-24

申请人： Hideo Tsuchiya ,  Yoshihide Kato ,  Kazuto Matsuki ,  Yasushi Sanada ,  Riki Ogawa ,  Takuro Nagao

发明人： Hideo Tsuchiya ,  Yoshihide Kato ,  Kazuto Matsuki ,  Yasushi Sanada ,  Riki Ogawa ,  Takuro Nagao

IPC分类号： G01N21/00 ,  G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.

摘要翻译： 一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案 使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定 存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同 成像装置。