公开(公告)号：US06696367B1

公开(公告)日：2004-02-24

申请号：US10260821

申请日：2002-09-27

Applicant: Ravinder Aggarwal ,  Jim Kusbel ,  Jim Alexander

Inventor： Ravinder Aggarwal ,  Jim Kusbel ,  Jim Alexander

IPC: H01L2131

CPC classification number: H01L21/67778 ,  H01L21/67781 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/14

Abstract: A substrate fabrication system is provided which includes a buffer station located inline between a front docking port and a loadlock chamber, the buffer station being operatively joined with a front handling chamber. Preferred embodiments employ a buffer station having a rack with reduced pitch, or relative spacing between shelves. Additional embodiments provide variable pitch end effectors as part of the disclosed fabrication system. Methods of fabricating wafers by quickly transferring them to purgeable buffer stations upon wafers arriving at a docking port are also provided.

Abstract translation: 提供了一种衬底制造系统，其包括位于前对接端口和负载锁定室之间的缓冲站，缓冲站与前处理室可操作地连接。 优选实施例采用具有具有减小的间距的搁架或搁架之间的相对间隔的缓冲站。 附加实施例提供作为所公开的制造系统的一部分的可变节距端部执行器。 还提供了在晶片到达对接端口时通过将晶片快速转移到可清洗缓冲站来制造晶片的方法。

公开(公告)号：US20070209593A1

公开(公告)日：2007-09-13

申请号：US11369773

申请日：2006-03-07

Applicant: Ravinder Aggarwal ,  Jim Kusbel

Inventor： Ravinder Aggarwal ,  Jim Kusbel

IPC: H01L21/677 ,  C23C16/00

CPC classification number: C23C16/54 ,  H01L21/67167 ,  H01L21/67196 ,  H01L21/68707

Abstract: This invention relates to an apparatus and a method for cooling a semiconductor wafer while it is being transferred from one station to another. More particularly, the invention relates to an active cooling system in the end effecter of a robot used for moving a semiconductor wafer from one process station to another.

Abstract translation: 本发明涉及一种半导体晶片在从一个工位转移到另一个工位时进行冷却的装置和方法。 更具体地，本发明涉及用于将半导体晶片从一个处理站移动到另一个处理站的机器人的末端执行器中的主动冷却系统。

公开(公告)号：US20050184270A1

公开(公告)日：2005-08-25

申请号：US11112166

申请日：2005-04-22

Applicant: Ravinder Aggarwal ,  Jim Kusbel ,  Jerry Davis

Inventor： Ravinder Aggarwal ,  Jim Kusbel ,  Jerry Davis

IPC: F16K3/02 ,  F16K51/00 ,  F16K3/00

CPC classification number: F16K51/00 ,  F16K3/0209

Abstract: A slit valve for a semiconductor processing apparatus, for fluidly sealing a passage connecting two chambers of the apparatus, such as a substrate reaction chamber and a region outside the reaction chamber. The slit valve comprises an actuator plate movable within a slot in one wall of the passage, the actuator plate and the slot oriented generally transverse to the passage. The actuator plate has a first position in which the valve is open, permitting the transfer of a substrate through the passage. The actuator plate also has a second position in which the valve is closed, and in which the actuator plate fluidly seals the passage such that fluid cannot flow through the passage across the actuator plate. A protective cover is configured to prevent debris within the passage (e.g., broken wafers, shards, particulate contaminants, etc.) from flowing into the slot when the actuator plate occupies its second position. In one embodiment, the cover is pivotably secured to the first wall of the passage, proximate the slot. In another embodiment, the cover is secured to the actuator plate, proximate an end thereof. In a preferred embodiment, the cover comprises a plate.

公开(公告)号：US07159846B2

公开(公告)日：2007-01-09

申请号：US11112166

申请日：2005-04-22

Applicant: Ravinder Aggarwal ,  Jim Kusbel ,  Jerry Davis

Inventor： Ravinder Aggarwal ,  Jim Kusbel ,  Jerry Davis

IPC: F16K51/00

CPC classification number: F16K51/00 ,  F16K3/0209

Abstract: A slit valve for a semiconductor processing apparatus, for fluidly sealing a passage connecting two chambers of the apparatus, such as a substrate reaction chamber and a region outside the reaction chamber. The slit valve comprises an actuator plate movable within a slot in one wall of the passage, the actuator plate and the slot oriented generally transverse to the passage. The actuator plate has a first position in which the valve is open, permitting the transfer of a substrate through the passage. The actuator plate also has a second position in which the valve is closed, and in which the actuator plate fluidly seals the passage such that fluid cannot flow through the passage across the actuator plate. A protective cover is configured to prevent debris within the passage (e.g., broken wafers, shards, particulate contaminants, etc.) from flowing into the slot when the actuator plate occupies its second position. In one embodiment, the cover is pivotably secured to the first wall of the passage, proximate the slot. In another embodiment, the cover is secured to the actuator plate, proximate an end thereof. In a preferred embodiment, the cover comprises a plate.

Abstract translation: 一种用于半导体处理设备的狭缝阀，用于流体地密封连接设备的两个室（例如基板反应室）和反应室外的区域的通道。 狭缝阀包括可在通道的一个壁中的狭槽内移动的致动器板，致动器板和通常横向于通道的狭槽。 致动器板具有阀打开的第一位置，允许基板通过通道传送。 致动器板还具有阀闭合的第二位置，并且致动器板流体地密封通道，使得流体不能流过穿过致动器板的通道。 保护盖构造成当致动器板处于其第二位置时防止通道内的碎屑（例如，破碎的晶片，碎片，微粒污染物等）流入槽中。 在一个实施例中，盖可靠地固定到通道的第一壁上。 在另一个实施例中，盖子靠近致动器板的端部固定到致动器板上。 在优选实施例中，盖包括板。

公开(公告)号：US06883776B2

公开(公告)日：2005-04-26

申请号：US10225546

申请日：2002-08-20

Applicant: Ravinder Aggarwal ,  Jim Kusbel ,  Jerry Davis

Inventor： Ravinder Aggarwal ,  Jim Kusbel ,  Jerry Davis

IPC: F16K3/02 ,  F16K51/00 ,  F16K31/44

CPC classification number: F16K51/00 ,  F16K3/0209

Abstract: A slit valve for a semiconductor processing apparatus, for fluidly sealing a passage connecting two chambers of the apparatus, such as a substrate reaction chamber and a region outside the reaction chamber. The slit valve comprises an actuator plate movable within a slot in one wall of the passage, the actuator plate and the slot oriented generally transverse to the passage. The actuator plate has a first position in which the valve is open, permitting the transfer of a substrate through the passage. The actuator plate also has a second position in which the valve is closed, and in which the actuator plate fluidly seals the passage such that fluid cannot flow through the passage across the actuator plate. A protective cover is configured to prevent debris within the passage (e.g., broken wafers, shards, particulate contaminants, etc.) from flowing into the slot when the actuator plate occupies its second position. In one embodiment, the cover is pivotably secured to the first wall of the passage, proximate the slot. In another embodiment, the cover is secured to the actuator plate, proximate an end thereof. In a preferred embodiment, the cover comprises a plate.

Abstract translation: 一种用于半导体处理设备的狭缝阀，用于流体地密封连接设备的两个室（例如基板反应室）和反应室外的区域的通道。 狭缝阀包括可在通道的一个壁中的狭槽内移动的致动器板，致动器板和通常横向于通道的狭槽。 致动器板具有阀打开的第一位置，允许基板通过通道传送。 致动器板还具有阀闭合的第二位置，并且致动器板流体地密封通道，使得流体不能流过穿过致动器板的通道。 保护盖构造成当致动器板处于其第二位置时防止通道内的碎屑（例如，破碎的晶片，碎片，微粒污染物等）流入槽中。 在一个实施例中，盖可靠地固定到通道的第一壁上。 在另一个实施例中，盖子靠近致动器板的端部固定到致动器板上。 在优选实施例中，盖包括板。