公开(公告)号：US20180025897A1

公开(公告)日：2018-01-25

申请号：US15550014

申请日：2016-02-10

Applicant: REVERA, INCORPORATED

Inventor： David A. REED ,  Bruno W SCHUELER ,  Bruce H NEWCOME ,  Rodney SMEDT ,  Chris BEVIS

IPC: H01J49/14 ,  G01Q10/04 ,  G01N23/22 ,  H01L21/66 ,  H01J49/26

CPC classification number: H01J49/142 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26 ,  H01L22/12

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).