CO-PLACEMENT OF RESISTOR AND OTHER DEVICES TO IMPROVE AREA & PERFORMANCE

    公开(公告)号:US20190304905A1

    公开(公告)日:2019-10-03

    申请号:US15992473

    申请日:2018-05-30

    Abstract: Co-placement of resistor and other devices to improve area and performance is disclosed. In one implementation, a semiconductor circuit includes a resistor residing on a back end of line (BEOL) resistor layer, a plurality of interlevel metal vias coupling the BEOL resistor layer to one or more metal layers underneath the BEOL resistor layer, and a diode residing on a silicon substrate underneath the one or more metal layers, wherein a planar surface of the diode and a planar surface of the resistor at least partially overlap with each other, and the diode and the resistor are coupled to each other through the plurality of interlevel metal vias.

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