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1.
公开(公告)号:US20190148916A1
公开(公告)日:2019-05-16
申请号:US16228683
申请日:2018-12-20
Inventor: Tougo NAKATANI , Takahiro OKAGUCHI , Norio IKEDO , Takeshi YOKOYAMA , Tomohito YABUSHITA , Toru TAKAYAMA , Shoichi TAKASUKA
Abstract: A semiconductor laser device includes: a first semiconductor layer on a first conductivity side; a second semiconductor layer on the first conductivity side; an active layer; a third semiconductor layer on a second conductivity side different from the first conductivity side; and a fourth semiconductor layer on the second conductivity side. Eg2 N3 is satisfied, where N2 denotes an impurity concentration of the second semiconductor layer, and N3 denotes an impurity concentration of the third semiconductor layer.
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2.
公开(公告)号:US20190131770A1
公开(公告)日:2019-05-02
申请号:US16234344
申请日:2018-12-27
Inventor: Norio IKEDO , Tougo NAKATANI , Takahiro OKAGUCHI , Takeshi YOKOYAMA , Tomohito YABUSHITA , Toru TAKAYAMA
Abstract: A semiconductor laser device includes: a first conductivity side semiconductor layer, an active layer; and a second conductivity side semiconductor layer. The second conductivity side semiconductor layer includes a first semiconductor layer and a second semiconductor layer, the first semiconductor layer being closer to the active layer than the second semiconductor layer is. The second semiconductor layer defines a width of a current injection region for injecting current into an optical waveguide. The current injection region includes a width varying region in which a width varies. S1>S2, where S1 denotes a width of the width varying region on a front end face side, and S2 denotes a width of the width varying region on a rear end face side.
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3.
公开(公告)号:US20200006921A1
公开(公告)日:2020-01-02
申请号:US16567336
申请日:2019-09-11
Inventor: Norio IKEDO , Tougo NAKATANI , Takahiro OKAGUCHI , Takeshi YOKOYAMA , Tomohito YABUSHITA , Toru TAKAYAMA
Abstract: A semiconductor laser device lases in a multiple transverse mode and includes a stacked structure where a first conductivity-side semiconductor layer, an active layer, and a second conductivity-side semiconductor layer are stacked above a substrate. The second conductivity-side semiconductor layer includes a current block layer having an opening that delimits a current injection region. Side faces as a pair are formed in portions of the stacked structure that range from part of the first conductivity-side semiconductor layer to the second conductivity-side semiconductor layer. The active layer has a second width greater than a first width of the opening. The side faces in at least part of the first conductivity-side semiconductor layer are inclined to the substrate. A maximum intensity position in a light distribution of light guided in the stacked structure, in a direction of the normal to the substrate, is within the first conductivity-side semiconductor layer.
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