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公开(公告)号:US20200269357A1
公开(公告)日:2020-08-27
申请号:US16776929
申请日:2020-01-30
Inventor: TAKESHI OMORI , KAZUKI FUJIWARA , TAKAYUKI ATEGI , YOSHIRO KITAMURA
IPC: B23K26/53 , B23K26/082 , B23K26/03
Abstract: To reduce a width of a modified layer and suppress positional variation of the modified layer, a crystal orientation of a workpiece is measured, a vertical direction with respect to an A-plane of the measured crystal orientation of the workpiece is specified, and a polarization direction of laser light is adjusted so that scanning of laser light is performed along the specified vertical direction with respect to the A-plane of the crystal orientation of the workpiece.