公开(公告)号：US20200258715A1

公开(公告)日：2020-08-13

申请号：US16782156

申请日：2020-02-05

Applicant: NuFlare Technology, Inc.

Inventor： Takahito NAKAYAMA ,  Yuji Abe

IPC: H01J37/304 ,  H01J37/317

Abstract: A charged particle beam writing apparatus includes a writer writing a pattern on a surface of a substrate using a charged particle beam, a measurement unit measuring a height of the surface of a central portion of the substrate at a plurality of positions in the central portion, a generator performing fitting using a first polynomial on measurement values from the measurement unit, calculating, by extrapolation using the first polynomial, a first height distribution of the height of the surface of a peripheral portion of the substrate, performing fitting using a second polynomial, which is of a higher order than the first polynomial, on the measurement values, calculating a second height distribution of the height of the surface of the central portion by interpolation using the second polynomial, and generating a height distribution of the substrate by combining the first height distribution and the second height distribution, and a controller adjusting a focal position of the charged particle beam based on the height of the surface at a writing position, the height being calculated from the height distribution of the substrate.

公开(公告)号：US11266999B2

公开(公告)日：2022-03-08

申请号：US16177615

申请日：2018-11-01

Applicant: NuFlare Technology, Inc.

Inventor： Yosuke Takahashi ,  Yuji Abe ,  Kiminobu Akeno

IPC: B01D53/02 ,  B03C3/47 ,  B03C3/86 ,  B03C3/68 ,  B08B6/00

Abstract: According to one embodiment, a dust-collecting apparatus includes a main body with a first surface on which a back surface of a first electrode is disposed; a fixing unit configured to control attachment and detachment of the first electrode and the main body; a second electrode configured to transfer a voltage to the first electrode; and a control board configured to control a magnitude and a timing of a voltage which is applied to the second electrode.

公开(公告)号：US11037757B2

公开(公告)日：2021-06-15

申请号：US16782156

申请日：2020-02-05

Applicant: NuFlare Technology, Inc.

Inventor： Takahito Nakayama ,  Yuji Abe

IPC: H01J37/317 ,  H01J37/304

Abstract: A charged particle beam writing apparatus includes a writer writing a pattern on a surface of a substrate using a charged particle beam, a measurement unit measuring a height of the surface of a central portion of the substrate at a plurality of positions in the central portion, a generator performing fitting using a first polynomial on measurement values from the measurement unit, calculating, by extrapolation using the first polynomial, a first height distribution of the height of the surface of a peripheral portion of the substrate, performing fitting using a second polynomial, which is of a higher order than the first polynomial, on the measurement values, calculating a second height distribution of the height of the surface of the central portion by interpolation using the second polynomial, and generating a height distribution of the substrate by combining the first height distribution and the second height distribution, and a controller adjusting a focal position of the charged particle beam based on the height of the surface at a writing position, the height being calculated from the height distribution of the substrate.