-
1.发明授权Simultaneous measurement of multiple overlay errors using diffraction based overlay 有权使用衍射叠加法同时测量多个重叠误差公开(公告)号：US09547244B2
公开(公告)日：2017-01-17
申请号：US14685494
申请日：2015-04-13
发明人： Jie Li
CPC分类号： G03F7/70633 , G01B11/14 , G03F7/70466 , G03F7/70683 , G03F9/7076
摘要： A plurality of overlay errors in a structure is determined using a target that includes a plurality of diffraction based overlay pads. Each diffraction based overlay pad has the same number of periodic patterns as the structure under test. Additionally, each diffraction based overlay pad includes a programmed shift between each pair of periodic patterns. The pads are illuminated and the resulting light is detected and used to simultaneously determine the plurality of overlay errors in the structure based on the programmed shifts. The overlay errors may be determined using a subset of elements of the Mueller matrix or by using the resulting spectra from the pads.
摘要翻译： 使用包括多个基于衍射的覆盖焊盘的目标来确定结构中的多个覆盖误差。 每个基于衍射的覆盖层具有与被测结构相同数量的周期性图案。 另外，每个基于衍射的覆盖层包括每对周期性图案之间的编程移位。 焊盘被照亮，并且检测到所得到的光并且用于基于编程的位移同时确定结构中的多个覆盖误差。 可以使用Mueller矩阵的元素的子集或通过使用来自垫的所得到的光谱来确定覆盖误差。
-
2.发明申请SIMULTANEOUS MEASUREMENT OF MULTIPLE OVERLAY ERRORS USING DIFFRACTION BASED OVERLAY 审中-公开使用基于差异叠加的多重重叠错误的同时测量公开(公告)号：US20150308817A1
公开(公告)日：2015-10-29
申请号：US14685494
申请日：2015-04-13
发明人： Jie Li
IPC分类号： G01B11/27
CPC分类号： G03F7/70633 , G01B11/14 , G03F7/70466 , G03F7/70683 , G03F9/7076
摘要： A plurality of overlay errors in a structure is determined using a target that includes a plurality of diffraction based overlay pads. Each diffraction based overlay pad has the same number of periodic patterns as the structure under test. Additionally, each diffraction based overlay pad includes a programmed shift between each pair of periodic patterns. The pads are illuminated and the resulting light is detected and used to simultaneously determine the plurality of overlay errors in the structure based on the programmed shifts. The overlay errors may be determined using a subset of elements of the Mueller matrix or by using the resulting spectra from the pads.
摘要翻译： 使用包括多个基于衍射的覆盖焊盘的目标来确定结构中的多个覆盖误差。 每个基于衍射的覆盖层具有与被测结构相同数量的周期性图案。 另外，每个基于衍射的覆盖层包括每对周期性图案之间的编程移位。 焊盘被照亮，并且检测到所得到的光并且用于基于编程的位移同时确定结构中的多个覆盖误差。 可以使用Mueller矩阵的元素的子集或通过使用来自垫的所得到的光谱来确定覆盖误差。
-
搜索结果
2 条记录 (耗时 0.012 秒)
