公开(公告)号：US20020090744A1

公开(公告)日：2002-07-11

申请号：US10005118

申请日：2001-12-07

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boaz Brill ,  Moshe Finarov

IPC: H01L021/00

CPC classification number: H01J37/28 ,  G01B15/00 ,  G01N21/47 ,  G01N21/956 ,  G01N23/225 ,  G03F7/70625 ,  H01J2237/2817

Abstract: A measurement method and system are presented for measuring parameters of a patterned structure. Scatterometry and SEM measurements are applied to the structure, measured data indicative of, respectively, the structure parameters and lateral pattern dimensions of the structure are generated. The entire measured data are analyzed so as to enable using measurement results of either one of the scatterometry and SEM measurements for optimizing the other measurement results.

Abstract translation: 提出了一种用于测量图案结构参数的测量方法和系统。 散射测量和SEM测量应用于结构，产生分别表示结构参数和结构的横向图形尺寸的测量数据。 分析整个测量数据，以便能够使用散射测量和SEM测量中的任一个的测量结果来优化其他测量结果。

公开(公告)号：US20020072003A1

公开(公告)日：2002-06-13

申请号：US09984640

申请日：2001-10-30

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boaz Brill ,  Yoel Cohen

IPC: G03F007/00 ,  G03F007/20 ,  G06F019/00 ,  G06F017/50

CPC classification number: G03F7/70491 ,  G03F7/705 ,  G03F7/70616 ,  H01L22/20

Abstract: A method is presented for controlling a process to be applied to a patterned structure in a production run. Reference data is provided being representative of diffraction signatures corresponding to a group of different fields in a structure similar to the patterned structure in the production line, and of a control window for the process parameters corresponding to a signature representative of desired process results. The group of different fields is characterized by different process parameters used in the manufacture of these fields. The method utilizes an expert system trained to be responsive to input data representative of a diffraction signature to provide output data representative of corresponding effective parameters of the process. Optical measurements are applied to different sites on the patterned structure in the production line to obtain diffraction signatures of thereof and generate corresponding measured data. The expert system analyses the measured data to determine effective parameters of the process applied to the patterned structure in the production line. The effective process parameters can then be analyzed to determine deviation thereof from corresponding nominal values, to thereby enable the process control.

Abstract translation: 提出了一种用于控制在生产运行中应用于图案化结构的工艺的方法。 提供了参考数据，其代表对应于类似于生产线中的图案化结构的结构中的一组不同场的衍射特征，以及对应于代表期望过程结果的签名的处理参数的控制窗口。 不同领域的组合的特征在于用于制造这些领域的不同工艺参数。 该方法利用受过训练的专家系统来响应代表衍射特征的输入数据，以提供代表该过程的相应有效参数的输出数据。 将光学测量应用于生产线上图案化结构上的不同位置，以获得其衍射特征并产生相应的测量数据。 专家系统分析测量数据，以确定应用于生产线上图案化结构的工艺的有效参数。 然后可以分析有效的工艺参数以确定其与相应的标称值的偏差，从而使得能够进行过程控制。

公开(公告)号：US20040109173A1

公开(公告)日：2004-06-10

申请号：US10724113

申请日：2003-12-01

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G01B011/14

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A measurement method and system configured to determine parameters of a structure during production, the system including: a stage configured to support the structure during measurements; a measuring unit coupled to the stage; and a processor coupled to the measuring unit. The measuring unit includes: an illumination system configured to direct incident light of substantially broad wavelengths band toward a surface of the structure during measurements; and a detection system coupled to the illumination system and configured to detect light propagating from the surface of the structure during measurements. The measuring unit is configured to generate one or more output signals in response to the detected light during measurements. The processor is configured to determine the parameters of the structure from the one or more output signals during measurements. The parameters include a critical dimension of the structure and a layer characteristic of the structure.

Abstract translation: 一种测量方法和系统，其被配置为在生产期间确定结构的参数，所述系统包括：被配置为在测量期间支撑所述结构的平台; 耦合到所述台的测量单元; 以及耦合到所述测量单元的处理器。 测量单元包括：照明系统，被配置为在测量期间将基本上宽的波长带的入射光引向结构的表面; 以及耦合到所述照明系统并被配置为在测量期间检测从所述结构的表面传播的光的检测系统。 测量单元被配置为在测量期间响应于检测到的光而产生一个或多个输出信号。 处理器被配置为在测量期间从一个或多个输出信号确定结构的参数。 参数包括结构的临界尺寸和结构的层特性。