公开(公告)号：US09620332B1

公开(公告)日：2017-04-11

申请号：US14703306

申请日：2015-05-04

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Enden David Liu ,  Cong Tran ,  Theodore A. Prescop

IPC: H01J37/00 ,  H01J37/29 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/292 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30494 ,  H01J2237/31761

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.