公开(公告)号：US20210309595A1

公开(公告)日：2021-10-07

申请号：US17264746

申请日：2019-07-31

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Yu OKADA ,  Tomoaki TAKIGAWA ,  Takashi MAKINOSHIMA ,  Masatoshi ECHIGO

IPC分类号： C07C39/14 ,  C08G8/04 ,  C07D311/82 ,  C07C37/60 ,  G02B1/04

摘要： Provided is a composition containing a polyphenol compound (B) and a solvent, in which the polyphenol compound (B) is at least one selected from a compound represented by the following formula (1) and a resin having a structure represented by the following formula (2): wherein RY, RT, X, m, N, r, and L are as described in the description.

公开(公告)号：US20200262787A1

公开(公告)日：2020-08-20

申请号：US16096645

申请日：2017-04-28

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Masatoshi ECHIGO ,  Tomoaki TAKIGAWA ,  Takumi TOIDA ,  Takashi SATO

IPC分类号： C07C395/00 ,  C08G79/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/00 ,  G02B1/04

摘要： The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

公开(公告)号：US20210047457A1

公开(公告)日：2021-02-18

申请号：US16963811

申请日：2019-01-18

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Masatoshi ECHIGO ,  Yu OKADA ,  Tomoaki TAKIGAWA ,  Takashi MAKINOSHIMA

IPC分类号： C08G10/04 ,  G03F7/11 ,  G03F7/004 ,  C08G8/10

摘要： An object of the present invention is to provide a compound and the like that are applicable to a wet process and are useful for forming a photoresist and an underlayer film for photoresists excellent in heat resistance, solubility, and etching resistance. A compound represented by the following formula (1) can solve the problem described above.