公开(公告)号：US11919850B2

公开(公告)日：2024-03-05

申请号：US16971043

申请日：2019-02-20

Applicant: Maruzen Petrochemical Co., Ltd.

Inventor： Satoshi Kakuta ,  Hiromitsu Baba ,  Teruyo Ikeda ,  Ryo Fujisawa ,  Kazuhiko Haba

IPC: C08F283/01 ,  C07C69/013 ,  C07C69/608 ,  C08F22/10 ,  C08F122/10 ,  C08F222/10 ,  C08F290/08 ,  C08L33/14 ,  G03F7/004 ,  C08F2/48

CPC classification number: C07C69/608 ,  C07C69/013 ,  C08F22/10 ,  C08F122/10 ,  C08F222/10 ,  C08F222/102 ,  C08F283/01 ,  C08F290/08 ,  C08L33/14 ,  G03F7/004 ,  C08F2/48 ,  C08F212/24 ,  C08F220/1806 ,  C08F222/102 ,  C08F222/14 ,  C08F220/1805 ,  C08F222/102

Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1):




(wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

公开(公告)号：US11814351B2

公开(公告)日：2023-11-14

申请号：US16971025

申请日：2019-02-20

Applicant: Maruzen Petrochemical Co., Ltd.

Inventor： Satoshi Kakuta ,  Hiromitsu Baba ,  Teruyo Ikeda ,  Ryo Fujisawa ,  Kazuhiko Haba

IPC: C07C69/602 ,  C08F22/26 ,  C08F12/24 ,  G03F7/027

CPC classification number: C07C69/602 ,  C08F12/24 ,  C08F22/26 ,  G03F7/027

Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1):




(wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

公开(公告)号：US10766973B2

公开(公告)日：2020-09-08

申请号：US15735748

申请日：2016-04-15

Applicant: MARUZEN PETROCHEMICAL CO., LTD.

Inventor： Tomohiro Masukawa ,  Ryo Fujisawa ,  Kazuhiko Haba ,  Satoshi Kakuta

IPC: C08F6/06 ,  C08G8/04 ,  C08G12/26 ,  C08F212/14 ,  C08F12/24 ,  C08F6/02

Abstract: Provided is a method for producing a polymer for an electronic material having a low content of metal ion impurities and a polymer for an electronic material obtained by such method.The method for producing a polymer for an electronic material according to the present invention comprises a polymerization step of obtaining a polymer by polymerizing a monomer(s) and a purification step of adding a strong acid having 0 or less pKa to the polymer solution and subsequently performing an ion exchange treatment to reduce the concentration of the metal ion impurities.

公开(公告)号：US11725078B2

公开(公告)日：2023-08-15

申请号：US16893577

申请日：2020-06-05

Applicant: MARUZEN PETROCHEMICAL CO., LTD.

Inventor： Tomohiro Masukawa ,  Ryo Fujisawa

IPC: B01J39/05 ,  C08G63/90 ,  C08G63/66 ,  G03F7/004 ,  G03F7/039

CPC classification number: C08G63/90 ,  B01J39/05 ,  C08G63/66 ,  G03F7/0045 ,  G03F7/0392

Abstract: [Problem to be Solved]
To Provide a method for producing an acid-decomposable polymer having a reduced metal ion content, which suppresses decomposition and deprotection of the acid-decomposable polymer.
[Means to Solve the Problem]
The method for producing an acid-decomposable polymer according to the present invention comprises the steps of:



preparing a polymer solution comprising an acid-decomposable polymer;
washing an acidic cation exchanger with an organic solvent until the water content in the organic solvent discharged from the acidic cation exchanger falls to 400 ppm or less; and
passing the polymer solution through the washed acidic cation exchanger to reduce the metal ion content of the polymer.