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    Mechanism to mitigate color breakup artifacts in field sequential color display systems
    1.
    发明授权
    Mechanism to mitigate color breakup artifacts in field sequential color display systems 失效
    减少现场顺序彩色显示系统中颜色分解伪影的机制

    公开(公告)号：US08115776B2

    公开(公告)日：2012-02-14

    申请号：US11913232

    申请日：2006-08-01

    申请人： Martin G. Selbrede ,  Rick Zemen

    发明人： Martin G. Selbrede ,  Rick Zemen

    IPC分类号： G09G5/10 ,  G09G3/16 ,  G09G3/30 ,  G06F3/08 ,  H04N9/04 ,  H04N9/12 ,  H04N5/74 ,  H04N1/46 ,  G06K9/00 ,  G06K9/40 ,  G06K9/76 ,  G03F3/08 ,  G02F1/135

    CPC分类号： G09G3/3413 ,  G09G3/2011 ,  G09G3/2014 ,  G09G3/3473 ,  G09G2310/0235 ,  G09G2320/0242 ,  G09G2320/0261 ,  G09G2320/0266

    摘要： A mechanism for mitigating undesired color image breakup artifacts arising in display systems that exploit the principle of field sequential color generation. By suitably reducing the time interval during which image information strikes the moving retina, such that the differential position for the respective red, green, and blue components of the image falling upon the moving retina does not exceed the diameter of a retinal cone or rod, the cause of the breakup is negated and the image becomes unitary as expected: the eye sees the image as if all the components arrived at the same time. The truncation of light emission into shorter time frames necessitates a compensatory increase in imaging light intensity, such that the net amount of photonic flux striking the retina, averaged over time, remains unchanged. The mechanism can be applied to systems with discrete red, green, and blue sources as well as to color-wheel-based systems.

    摘要翻译： 一种用于减轻显示系统中出现的不期望的彩色图像分解伪像的机制，该机制利用了场顺序颜色生成的原理。 通过适当地减少图像信息撞击移动的视网膜的时间间隔，使得落在移动的视网膜上的图像的相应红色，绿色和蓝色分量的差分位置不超过视网膜锥体或棒的直径， 分解的原因被否定，并且图像像预期一样变得单一：眼睛看到图像，好像所有的组件都同时到达。 将光发射截短为较短的时间框架需要成像光强度的补偿性增加，使得撞击视网膜的光子通量的净量随时间平均保持不变。 该机制可以应用于具有离散红，绿和蓝光源以及基于色轮的系统的系统。

    Mechanism to Mitigate Color Breakup Artifacts in Field Sequential Color Display Systems
    2.
    发明申请
    Mechanism to Mitigate Color Breakup Artifacts in Field Sequential Color Display Systems 失效
    减少现场顺序彩色显示系统中色彩破坏的机制

    公开(公告)号：US20080192065A1

    公开(公告)日：2008-08-14

    申请号：US11913232

    申请日：2006-08-01

    申请人： Martin G. Selbrede ,  Rick Zemen

    发明人： Martin G. Selbrede ,  Rick Zemen

    IPC分类号： G09G5/02

    CPC分类号： G09G3/3413 ,  G09G3/2011 ,  G09G3/2014 ,  G09G3/3473 ,  G09G2310/0235 ,  G09G2320/0242 ,  G09G2320/0261 ,  G09G2320/0266

    摘要： A mechanism for mitigating undesired color image breakup artifacts arising in display systems that exploit the principle of field sequential color generation. By suitably reducing the time interval during which image information strikes the moving retina, such that the differential position for the respective red, green, and blue components of the image falling upon the moving retina does not exceed the diameter of a retinal cone or rod, the cause of the breakup is negated and the image becomes unitary as expected: the eye sees the image as if all the components arrived at the same time. The truncation of light emission into shorter time frames necessitates a compensatory increase in imaging light intensity, such that the net amount of photonic flux striking the retina, averaged over time, remains unchanged. The mechanism can be applied to systems with discrete red, green, and blue sources as well as to color-wheel-based systems.

    摘要翻译： 一种用于减轻显示系统中出现的不期望的彩色图像分解伪像的机制，该机制利用了场顺序颜色生成的原理。 通过适当地减少图像信息撞击移动的视网膜的时间间隔，使得落在移动的视网膜上的图像的相应红色，绿色和蓝色分量的差分位置不超过视网膜锥体或棒的直径， 分解的原因被否定，并且图像像预期一样变得单一：眼睛看到图像，好像所有的组件都同时到达。 将光发射截短为较短的时间框架需要成像光强度的补偿性增加，使得撞击视网膜的光子通量的净量随时间平均保持不变。 该机制可以应用于具有离散红，绿和蓝光源以及基于色轮的系统的系统。

    MECHANISM TO MITIGATE COLOR BREAKUP ARTIFACTS IN FIELD SEQUENTIAL COLOR DISPLAY SYSTEMS
    4.
    发明申请
    MECHANISM TO MITIGATE COLOR BREAKUP ARTIFACTS IN FIELD SEQUENTIAL COLOR DISPLAY SYSTEMS 失效
    降低场地顺序颜色显示系统中的彩色破坏作品的机制

    公开(公告)号：US20110255013A1

    公开(公告)日：2011-10-20

    申请号：US13113571

    申请日：2011-05-23

    申请人： Martin G. Selbrede ,  Rick Zemen

    发明人： Martin G. Selbrede ,  Rick Zemen

    IPC分类号： H04N5/66

    CPC分类号： G09G3/3413 ,  G09G3/2011 ,  G09G3/2014 ,  G09G3/3473 ,  G09G2310/0235 ,  G09G2320/0242 ,  G09G2320/0261 ,  G09G2320/0266

    摘要： A system and method for displaying video images in response to each frame of field-sequential video signals. The system comprises a backlight comprising first, second and third primary color light sources. The backlight is operable to emit light for at most 5.67 milliseconds of each frame (on-time), and to emit no light during the remainder of each frame (off-time). During a portion of the on-time, at least two of the primary color light sources are on simultaneously. For another portion of the on-time, the primary color light sources are on sequentially.

    摘要翻译： 一种响应于场顺序视频信号的每帧显示视频图像的系统和方法。 该系统包括一种包括第一，第二和第三原色光源的背光源。 背光可操作以发射每帧（导通时间）至多5.67毫秒的光，并且在每帧的剩余时间（关闭时间）期间不发光。 在导通时间的一部分期间，至少两个原色光源同时开启。 对于导通时间的另一部分，原色光源依次进行。

    Method of manufacturing photomasks by plasma etching with resist stripped
    5.
    发明授权
    Method of manufacturing photomasks by plasma etching with resist stripped 有权

    公开(公告)号：US06406818B1

    公开(公告)日：2002-06-18

    申请号：US09283087

    申请日：1999-03-31

    申请人： Rick Zemen ,  Tiecheng Zhou

    发明人： Rick Zemen ,  Tiecheng Zhou

    IPC分类号： G03F900

    CPC分类号： G03F1/58 ,  G03F1/46 ,  G03F1/72 ,  G03F1/80

    摘要： A method for adjusting out of tolerance critical dimensions of an under processed photomask to be within predetermined defined limits after the photosensistive resist material has been removed from the exposed photomask. The method includes measuring the critical dimensions of the opaque material of the under processed photomask after the photosensitive resist material has been removed, and exposing the photomask to electrified plasma gases for removing excess opaque material without degrading the reflectivity of the photomask beyond specified limits.

    Method of manufacturing photomasks by plasma etching with resist stripped
    6.
    发明授权
    Method of manufacturing photomasks by plasma etching with resist stripped 有权

    公开(公告)号：US06562549B2

    公开(公告)日：2003-05-13

    申请号：US10136251

    申请日：2002-04-29

    申请人： Rick Zemen ,  Tiecheng Zhou

    发明人： Rick Zemen ,  Tiecheng Zhou

    IPC分类号： G03C500

    CPC分类号： G03F1/58 ,  G03F1/46 ,  G03F1/72 ,  G03F1/80

    摘要： A method for adjusting out of tolerance critical dimensions of an under processed photomask to be within predetermined defined limits after the photosensistive resist material has been removed from the exposed photomask. The method includes measuring the critical dimensions of the opaque material of the under processed photomask after the photosensitive resist material has been removed, and exposing the photomask to electrified plasma gases for removing excess opaque material without degrading the reflectivity of the photomask beyond specified limits.