公开(公告)号：US20150293460A1

公开(公告)日：2015-10-15

申请号：US14683560

申请日：2015-04-10

Applicant: Lasertec Corporation

Inventor： Kiwamu TAKEHISA ,  Atsushi TAJIMA ,  Haruhiko KUSUNOSE

IPC: G03F7/20

CPC classification number: G03F1/84 ,  G03F1/62

Abstract: Provided with a pellicle inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography. The pellicle inspection apparatus includes: an illumination optical system that projects a converging illuminating beam toward the pellicle film;a light collection optical system including an object lens having an optical axis substantially orthogonal to the pellicle film and that collects scattering light outgoing from a foreign substance present on the pellicle film; and a detection system that detects the scattering light collected by the light collection optical system, wherein an incident angle θ2 of the illuminating beam with respect to the pellicle film satisfies Expression θ2−θ0>θ1+23°, where θ0 is a collecting angle (half angle) of the illuminating beam, and θ1 is a maximum light-receiving angle (half angle) of the object lens.

Abstract translation: 提供一种防护薄膜组件检查装置，其检查设有防护薄膜的掩模的防护薄膜，并用于EUV光刻。 防护薄膜检查装置包括：照射光学系统，其将会聚的照明光束投射到防护薄膜上; 光收集光学系统，其包括物镜，所述物镜具有基本上垂直于所述防护薄膜的光轴并且收集从所述防护薄膜上存在的异物射出的散射光; 以及检测系统，其检测由所述光收集光学系统收集的散射光，其中所述照明光束相对于所述防护薄膜的入射角和角度2满足表达式;所述2＆ ，其中＆thetas; 0是照明光束的收集角（半角），＆lt; 1＆gt;; 1是物镜的最大光接收角（半角）。