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公开(公告)号:US20240222151A1
公开(公告)日:2024-07-04
申请号:US18557043
申请日:2022-04-28
发明人: Eli Jeon , Michael Philip Roberts , Douglas Walter Agnew , Daniel Boatright , Arun Anandhan Duraisamy , Joseph R. Abel , William Laurence McDaniel
IPC分类号: H01L21/67
CPC分类号: H01L21/67017
摘要: The present disclosure relates to a system for a semiconductor processing. The system includes a semiconductor processing chamber having a plurality of processing stations, a plurality of manifold trunks, a plurality of valves, and a plurality of fluid manifolds. Each manifold trunk includes an outlet, a common flowpath, a plurality of trunk inlets, a plurality of orifices, and a plurality of valve interfaces.