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公开(公告)号：US20220282377A1
公开(公告)日：2022-09-08
申请号：US17753083
申请日：2020-08-21
发明人： Bin Luo , Timothy Scott Thomas , Matthew B. Schick , John Michael Wiltse , Sean M. Donnelly , Michael John Selep
IPC分类号： C23C16/455
摘要： Showerheads for semiconductor processing equipment are disclosed that include various features designed to promote thermal control of the showerhead in high-temperature applications.
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2.发明公开公开(公告)号：US20240112890A1
公开(公告)日：2024-04-04
申请号：US18529576
申请日：2023-12-05
发明人： Michael John Selep , Patrick G. Breiling , Karl Frederick Leeser , Timothy Scott Thomas , David William Kamp , Sean M. Donnelly
IPC分类号： H01J37/32
CPC分类号： H01J37/3244
摘要： A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.
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3.发明申请公开(公告)号：US20210210310A1
公开(公告)日：2021-07-08
申请号：US17211256
申请日：2021-03-24
发明人： Michael John Selep , Patrick G. Breiling , Karl Frederick Leeser , Timothy Scott Thomas , David William Kamp , Sean M. Donnelly
IPC分类号： H01J37/32
摘要： A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.
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4.发明授权公开(公告)号：US10984987B2
公开(公告)日：2021-04-20
申请号：US16156918
申请日：2018-10-10
发明人： Michael John Selep , Patrick G. Breiling , Karl Frederick Leeser , Timothy Scott Thomas , David William Kamp , Sean M. Donnelly
IPC分类号： H01J37/32
摘要： A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.
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5.发明授权公开(公告)号：US11837443B2
公开(公告)日：2023-12-05
申请号：US18071260
申请日：2022-11-29
发明人： Michael John Selep , Patrick G. Breiling , Karl Frederick Leeser , Timothy Scott Thomas , David William Kamp , Sean M. Donnelly
IPC分类号： H01J37/32
CPC分类号： H01J37/3244
摘要： A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.
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6.发明申请公开(公告)号：US20230099566A1
公开(公告)日：2023-03-30
申请号：US18071260
申请日：2022-11-29
发明人： Michael John Selep , Patrick G. Breiling , Karl Frederick Leeser , Timothy Scott Thomas , David William Kamp , Sean M. Donnelly
IPC分类号： H01J37/32
摘要： A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.
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7.发明授权公开(公告)号：US11515124B2
公开(公告)日：2022-11-29
申请号：US17211256
申请日：2021-03-24
发明人： Michael John Selep , Patrick G. Breiling , Karl Frederick Leeser , Timothy Scott Thomas , David William Kamp , Sean M. Donnelly
IPC分类号： H01J37/32
摘要： A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.
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