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公开(公告)号：US20200173018A1
公开(公告)日：2020-06-04
申请号：US16205028
申请日：2018-11-29
IPC分类号： C23C16/458 , C23C16/455
摘要： A pedestal assembly including a pedestal for supporting a substrate. A central shaft positions the pedestal at a height during operation. A ring is placed along a periphery of the pedestal. A ring adjuster subassembly includes an adjuster flange disposed around a middle section of the central shaft. The subassembly includes a sleeve connected to the adjuster flange and extending from the adjuster flange to an adjuster plate disposed under the pedestal. The subassembly includes ring adjuster pins connected to the adjuster plate and extending vertically from the adjuster plate. Each of the ring adjuster pins being positioned on the adjuster plate at locations adjacent to and outside of a pedestal diameter. The ring adjuster pins contacting an edge undersurface of the ring. The adjuster flange coupled to at least three adjuster actuators for defining an elevation and tilt of the ring relative to a top surface of the pedestal.
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公开(公告)号：US20230366089A1
公开(公告)日：2023-11-16
申请号：US18029641
申请日：2021-10-08
发明人： Shriram Vasant Bapat , Pankaj Ghanshyam Ramnani , Brian Joseph Williams , Christopher Matthew Jones , Curtis W. Bailey , Emile Draper , Nagraj Shankar
IPC分类号： C23C16/455 , C23C16/505
CPC分类号： C23C16/45565 , C23C16/505
摘要： In some examples, a faceless showerhead comprises a body including a backing plate, the body devoid of a faceplate or plenum; a gas supply stem to admit gas into the showerhead; and a baffle supported adjacent the backing plate or the gas supply stem. The faceless showerhead may further comprise at least one support element for supporting the baffle in a baffle cavity in the backing plate or the gas supply stem.
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公开(公告)号：US11512393B2
公开(公告)日：2022-11-29
申请号：US16205028
申请日：2018-11-29
IPC分类号： C23C16/458 , C23C16/455
摘要： A pedestal assembly including a pedestal for supporting a substrate. A central shaft positions the pedestal at a height during operation. A ring is placed along a periphery of the pedestal. A ring adjuster subassembly includes an adjuster flange disposed around a middle section of the central shaft. The subassembly includes a sleeve connected to the adjuster flange and extending from the adjuster flange to an adjuster plate disposed under the pedestal. The subassembly includes ring adjuster pins connected to the adjuster plate and extending vertically from the adjuster plate. Each of the ring adjuster pins being positioned on the adjuster plate at locations adjacent to and outside of a pedestal diameter. The ring adjuster pins contacting an edge undersurface of the ring. The adjuster flange coupled to at least three adjuster actuators for defining an elevation and tilt of the ring relative to a top surface of the pedestal.
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公开(公告)号：US20230088715A1
公开(公告)日：2023-03-23
申请号：US18071192
申请日：2022-11-29
IPC分类号： C23C16/458 , C23C16/455
摘要： A pedestal assembly including a pedestal for supporting a substrate. A central shaft positions the pedestal at a height during operation. A ring is placed along a periphery of the pedestal. A ring adjuster subassembly includes an adjuster flange disposed around a middle section of the central shaft. The subassembly includes a sleeve connected to the adjuster flange and extending from the adjuster flange to an adjuster plate disposed under the pedestal. The subassembly includes ring adjuster pins connected to the adjuster plate and extending vertically from the adjuster plate. Each of the ring adjuster pins being positioned on the adjuster plate at locations adjacent to and outside of a pedestal diameter. The ring adjuster pins contacting an edge undersurface of the ring. The adjuster flange coupled to at least three adjuster actuators for defining an elevation and tilt of the ring relative to a top surface of the pedestal.
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公开(公告)号：US20230052089A1
公开(公告)日：2023-02-16
申请号：US17796406
申请日：2021-02-04
发明人： Jeffrey Womack , Karl Frederick Leeser , Curtis W. Bailey , Keith Joseph Martin , Rigel Martin Bruening , Nick Ray Linebarger, JR.
IPC分类号： H01J37/32 , C23C16/44 , C23C16/52 , C23C16/505
摘要： A reactor system comprises a process chamber, a gas inlet, and a dispenser. The dispenser is coupled to the gas inlet. The dispenser controls a gas flow from a vial to the gas inlet. The vial includes a coating material that, when released inside the process chamber under operating conditions of the reaction system, coats an inner wall of the process chamber.
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