公开(公告)号：US20200219708A1

公开(公告)日：2020-07-09

申请号：US16238926

申请日：2019-01-03

Applicant: LAM RESEARCH CORPORATION

Inventor： Maolin LONG ,  Neema RASTGAR ,  Alexander Miller PATERSON

IPC: H01J37/32 ,  H01L21/67

Abstract: A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil includes at least one terminal. An RF source configured to supply RF power to the coil. A dielectric window is arranged on one surface of the processing chamber adjacent to the coil. A contamination reducer includes a first plate that is arranged between the at least one terminal of the coil and the dielectric window.