公开(公告)号：US20230126058A1

公开(公告)日：2023-04-27

申请号：US17913119

申请日：2021-03-22

Applicant: LAM RESEARCH CORPORATION

Inventor： Maolin LONG ,  Michael John MARTIN ,  Matthew Lowell TALLEY ,  Yuhou WANG ,  Alexander Miller PATERSON ,  David Robert BIGGS

IPC: H01J37/32

Abstract: A lid assembly for a processing chamber in a substrate processing system includes a dielectric window. The dielectric window includes an upper portion having flat upper and lower surfaces. The lower surface is a plasma-facing surface of the dielectric window. A lower portion of the dielectric window is cylindrical and extends downward from the lower surface and an outer diameter of the lower portion at least one of is aligned with a gap between inner and outer coils arranged above the dielectric window and overlaps one of the inner and outer coils.