公开(公告)号：US08987164B2

公开(公告)日：2015-03-24

申请号：US13708813

申请日：2012-12-07

Applicant: Korea Advanced Institute of Science and Technology

Inventor： Jeung-Ku Kang ,  Dong-Ki Lee ,  Kyu-Sung Han ,  Weon-Ho Shin ,  Jung-Woo Lee ,  Jung-Hoon Choi ,  Kyung-Min Choi ,  Yeob Lee

IPC: B01J21/18 ,  B01J23/00 ,  H01B1/02 ,  H01B1/06 ,  H05B7/085 ,  H01L21/02 ,  H01L29/06 ,  H01L51/00

CPC classification number: H01L21/0228 ,  H01L29/0603 ,  H01L51/0045 ,  Y10S977/811 ,  Y10S977/823 ,  Y10S977/90

Abstract: A semiconductor of which a substance such as a semiconductor photocatalyst is uniformly coated on the surface thereof with a graphitic carbon film and a method of fabricating the same are disclosed. According to the inventive method, a graphitic carbon film having a thickness of 1 nm or less is uniformly formed on the surface of the semiconductor by performing hydrothermal synthesis and pyrolysis on glucose, so as to keep the original structure crystallinity of the semiconductor photocatalyst to be a support of the carbon film.

Abstract translation: 公开了一种半导体，其半导体光催化剂等物质用石墨碳膜均匀地涂覆在其表面上，以及制造方法。 根据本发明的方法，通过对葡萄糖进行水热合成和热解，在半导体的表面上均匀地形成厚度为1nm以下的石墨碳膜，以保持半导体光催化剂的原始结构结晶度为 碳膜的支撑。