公开(公告)号：US20210170542A1

公开(公告)日：2021-06-10

申请号：US16806558

申请日：2020-03-02

申请人： KIOXIA CORPORATION

发明人： Mikiya SAKASHITA ,  Yukiteru MATSUI ,  Akifumi GAWASE

IPC分类号： B24B37/20 ,  B24B37/04 ,  H01L21/67 ,  H01L21/306

摘要： According to one embodiment, a polishing apparatus includes a holder for holding a polishing pad for polishing a surface of a substrate. A plurality of pressing members are configured to press a back surface side of the polishing pad while held by the holder. A driving unit is configured to selectively move pressing members in a direction towards the surface of the substrate so as to press the back surface side of the polishing pad.

公开(公告)号：US20210082711A1

公开(公告)日：2021-03-18

申请号：US16820888

申请日：2020-03-17

申请人： Kioxia Corporation

发明人： Akifumi GAWASE ,  Yukiteru MATSUI ,  Mikiya SAKASHITA

IPC分类号： H01L21/3105 ,  H01L21/033 ,  H01L21/311

摘要： A method for manufacturing a semiconductor device according to an embodiment includes: forming a first layer on a semiconductor substrate, a surface of the first layer having a first plane of which distance from the semiconductor substrate is a first distance and a second plane of which distance from the semiconductor substrate is a second distance smaller than the first distance, and a difference between the first distance and the second distance being 30 nm or more; performing planarization processing on the first layer to have the difference of less than 30 nm; forming a second layer directly on the first layer after performing the planarization processing; supplying a resist to the second layer; bringing a template having a pattern into contact with the resist to form a resist layer to which the pattern has been transferred; and etching the second layer using the resist layer as a mask.

公开(公告)号：US20220290009A1

公开(公告)日：2022-09-15

申请号：US17447343

申请日：2021-09-10

申请人： Kioxia Corporation

发明人： Mikiya SAKASHITA ,  Yukiteru MATSUI

IPC分类号： C09G1/18 ,  B24B37/10 ,  B24B41/06 ,  B24B37/015

摘要： A polishing solution according to an embodiment includes an exothermic agent that generates heat through application of an alternating magnetic field thereto, and a viscosity modifier that undergoes a reversible phase transition between a gel state and a sol state depending on temperature.