公开(公告)号：US20230125229A1

公开(公告)日：2023-04-27

申请号：US17456839

申请日：2021-11-29

Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE

Inventor： Hyeong Keun KIM ,  Seul Gi KIM ,  Hyun Mi KIM ,  Jin Woo CHO ,  Ki Hun SEONG

IPC: G03F1/62 ,  G03F7/20 ,  G03F7/11

Abstract: A pellicle for extreme ultraviolet (EUV) lithography is based on yttrium carbide and used in a EUV lithography process. The pellicle for EUV lithography includes a pellicle layer that has a core layer containing yttrium carbide. The yttrium carbide is YCX (0.25

公开(公告)号：US20220334464A1

公开(公告)日：2022-10-20

申请号：US17698455

申请日：2022-03-18

Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE

Inventor： Hyeong Keun KIM ,  Seul Gi KIM ,  Hyun Mi KIM ,  Jin Woo CHO ,  Ki Hun SEONG

IPC: G03F1/64 ,  G03F7/20

Abstract: This application relates to a pellicle for extreme ultraviolet lithography used in a lithography process using extreme ultraviolet rays. In one aspect, the pellicle includes a pellicle layer formed of an M-α material in which M is combined with α. Here, M is one of Si, Zr, Mo, Ru, Y, W, Ti, Ir, or Nb, and a is at least two of B, N, C, O, or F.

公开(公告)号：US20220326601A1

公开(公告)日：2022-10-13

申请号：US17698383

申请日：2022-03-18

Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE

Inventor： Hyeong Keun KIM ,  Seul Gi KIM ,  Hyun Mi KIM ,  Jin Woo CHO ,  Ki Hun SEONG

IPC: G03F1/64 ,  G03F1/22 ,  G03F7/20 ,  G02B5/20 ,  G02B5/28

Abstract: This application relates to a pellicle for extreme ultraviolet lithography based on yttrium (Y) and used in a lithography process using extreme ultraviolet rays. In one aspect, the pellicle includes a pellicle layer including a core layer formed of an yttrium-based material expressed as Y-M (M is one of B, Si, O, or F).

公开(公告)号：US20220146949A1

公开(公告)日：2022-05-12

申请号：US17454104

申请日：2021-11-09

Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE

Inventor： Hyeong Keun KIM ,  Hyun Mi KIM ,  Jin Woo CHO ,  Seul Gi KIM ,  Ki Hun SEONG

IPC: G03F7/20

Abstract: A pellicle for extreme ultraviolet lithography has an extreme ultraviolet transmittance of 90% or more and also has thermal stability, mechanical stability, and chemical durability. The pellicle includes a support layer and a pellicle layer. The support layer has an opening formed in a central portion thereof. The pellicle layer is formed on the support layer to cover the opening and includes ZrBx (2