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公开(公告)号:US10732515B2
公开(公告)日:2020-08-04
申请号:US16138813
申请日:2018-09-21
Applicant: KLA-Tencor Corporation
Inventor: Phillip R. Atkins , Qi Dai , Liequan Lee
Abstract: Methods and systems for performing spectroscopic measurements of asymmetric features of semiconductor structures are presented herein. In one aspect, measurements are performed at two or more azimuth angles to ensure sensitivity to an arbitrarily oriented asymmetric feature. Spectra associated with one or more off-diagonal Mueller matrix elements sensitive to asymmetry are integrated over wavelength to determine one or more spectral response metrics. In some embodiments, the integration is performed over one or more wavelength sub-regions selected to increase signal to noise ratio. Values of parameters characterizing an asymmetric feature are determined based on the spectral response metrics and critical dimension parameters measured by traditional spectral matching based techniques.
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公开(公告)号:US20190094711A1
公开(公告)日:2019-03-28
申请号:US16138813
申请日:2018-09-21
Applicant: KLA-Tencor Corporation
Inventor: Phillip R. Atkins , Qi Dai , Liequan Lee
Abstract: Methods and systems for performing spectroscopic measurements of asymmetric features of semiconductor structures are presented herein. In one aspect, measurements are performed at two or more azimuth angles to ensure sensitivity to an arbitrarily oriented asymmetric feature. Spectra associated with one or more off-diagonal Mueller matrix elements sensitive to asymmetry are integrated over wavelength to determine one or more spectral response metrics. In some embodiments, the integration is performed over one or more wavelength sub-regions selected to increase signal to noise ratio. Values of parameters characterizing an asymmetric feature are determined based on the spectral response metrics and critical dimension parameters measured by traditional spectral matching based techniques.
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