Apparatus and methods for optics protection from debris in plasma-based light source

    公开(公告)号:US10101664B2

    公开(公告)日:2018-10-16

    申请号:US14739305

    申请日:2015-06-15

    Abstract: Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.

    APPARATUS, SYSTEM, AND METHOD FOR SEPARATING GASES AND MITIGATING DEBRIS IN A CONTROLLED PRESSURE ENVIRONMENT
    2.
    发明申请
    APPARATUS, SYSTEM, AND METHOD FOR SEPARATING GASES AND MITIGATING DEBRIS IN A CONTROLLED PRESSURE ENVIRONMENT 审中-公开
    用于分离气体并减轻控制压力环境中的破坏的装置,系统和方法

    公开(公告)号:US20140166051A1

    公开(公告)日:2014-06-19

    申请号:US14105986

    申请日:2013-12-13

    CPC classification number: G03F7/70916 G03F7/70033 H01J37/32449 H05G2/001

    Abstract: An assembly, including: a nozzle including a first chamber with a first orifice arranged to receive a stream of gas; a second chamber with a second orifice to emit the stream; a throat connecting the nozzle chambers; and a collector including: top and bottom walls with first and second openings; a third chamber bounded by the top and bottom walls and including a third opening connected to the second orifice to receive the stream; and a fourth opening. The first chamber tapers from the first orifice to the throat. The second chamber expands in size from the throat to the second orifice. The third chamber expands in size from the third opening to the fourth opening. The collector is arranged to: entrain, in the stream, debris entering the third chamber through first or second opening; and emit the stream, with the entrained debris, from the fourth opening.

    Abstract translation: 一种组件,包括:喷嘴,其包括具有布置成接收气流的第一孔的第一室; 具有第二孔的第二室,用于排出所述流; 连接喷嘴室的喉部; 和收集器,包括:具有第一和第二开口的顶壁和底壁; 第三室,其由顶壁和底壁限定,并且包括连接到第二孔以接收流的第三开口; 和第四个开口。 第一个室从第一个孔到喉咙逐渐变细。 第二腔室的尺寸从喉部扩大到第二孔口。 第三室从第三个开口扩大到第四个开口。 收集器布置成:在流中夹带通过第一或第二开口进入第三室的碎屑; 并从第四个开口排出带有夹带的碎屑的流。

    APPARATUS AND METHODS FOR OPTICS PROTECTION FROM DEBRIS IN PLASMA-BASED LIGHT SOURCE
    3.
    发明申请
    APPARATUS AND METHODS FOR OPTICS PROTECTION FROM DEBRIS IN PLASMA-BASED LIGHT SOURCE 审中-公开
    用于基于等离子体光源的DEBRIS的光学保护的装置和方法

    公开(公告)号:US20160128171A1

    公开(公告)日:2016-05-05

    申请号:US14739305

    申请日:2015-06-15

    CPC classification number: G03F7/70033 G03F7/70916 G03F7/70933

    Abstract: Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.

    Abstract translation: 公开了用于产生照明光束的方法和装置。 在一个实施例中,该设备包括被配置为保持目标材料的真空室,定位在真空室内的光学元件或者在该真空室的壁内的真空室,以及用于产生至少一个激发源的照明源系统 真空室中的目标,用于在真空室中产生等离子体,以产生照射辐射。 该装置还包括用于使气体从多个喷嘴流出并以等离子体的速度远离光学元件的碎屑保护系统,以防止碎片到达这种光学元件。

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