公开(公告)号：US11073487B2

公开(公告)日：2021-07-27

申请号：US15974962

申请日：2018-05-09

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Nikolay Artemiev ,  Joseph A. Di Regolo ,  Antonio Gellineau ,  Alexander Kuznetsov ,  Andrei Veldman ,  John Hench

IPC: G01N23/02 ,  G01N23/201 ,  H01L21/67 ,  G01N23/205 ,  G01N23/207 ,  H01L21/68 ,  H01L21/687

Abstract: Methods and systems for positioning a specimen and characterizing an x-ray beam incident onto the specimen in a Transmission, Small-Angle X-ray Scatterometry (T-SAXS) metrology system are described herein. A specimen positioning system locates a wafer vertically and actively positions the wafer in six degrees of freedom with respect to the x-ray illumination beam without attenuating the transmitted radiation. In some embodiments, a cylindrically shaped occlusion element is scanned across the illumination beam while the detected intensity of the transmitted flux is measured to precisely locate the beam center. In some other embodiments, a periodic calibration target is employed to precisely locate the beam center. The periodic calibration target includes one or more spatially defined zones having different periodic structures that diffract X-ray illumination light into distinct, measurable diffraction patterns.

公开(公告)号：US20170307548A1

公开(公告)日：2017-10-26

申请号：US15495634

申请日：2017-04-24

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Nikolay Artemiev ,  Joseph A. Di Regolo ,  John Wade Viatella

IPC: G01N23/201 ,  G01N23/20 ,  G21K1/02

CPC classification number: G01N23/201 ,  G01N2223/054 ,  G01N2223/309 ,  G01N2223/316 ,  G21K1/04 ,  G21K7/00

Abstract: Methods and systems for reducing the effect of finite source size on illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements are described herein. A beam shaping slit having a slender profile is located in close proximity to the specimen under measurement and does not interfere with wafer stage components over the full range of angles of beam incidence. In one embodiment, four independently actuated beam shaping slits are employed to effectively block a portion of an incoming x-ray beam and generate an output beam having a box shaped illumination cross-section. In one aspect, each of the beam shaping slits is located at a different distance from the specimen in a direction aligned with the beam axis. In another aspect, the beam shaping slits are configured to rotate about the beam axis in coordination with the orientation of the specimen.

公开(公告)号：US10359377B2

公开(公告)日：2019-07-23

申请号：US15495634

申请日：2017-04-24

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Nikolay Artemiev ,  Joseph A. Di Regolo ,  John Wade Viatella

IPC: G21K1/04 ,  G01N23/201 ,  G21K7/00

Abstract: Methods and systems for reducing the effect of finite source size on illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements are described herein. A beam shaping slit having a slender profile is located in close proximity to the specimen under measurement and does not interfere with wafer stage components over the full range of angles of beam incidence. In one embodiment, four independently actuated beam shaping slits are employed to effectively block a portion of an incoming x-ray beam and generate an output beam having a box shaped illumination cross-section. In one aspect, each of the beam shaping slits is located at a different distance from the specimen in a direction aligned with the beam axis. In another aspect, the beam shaping slits are configured to rotate about the beam axis in coordination with the orientation of the specimen.

公开(公告)号：US10481111B2

公开(公告)日：2019-11-19

申请号：US15789992

申请日：2017-10-21

Applicant: KLA-Tencor Corporation

Inventor： John Hench ,  Antonio Gellineau ,  Nikolay Artemiev ,  Joseph A. Di Regolo

IPC: G01N23/20 ,  G01N23/201 ,  G01N23/083 ,  G21K1/06

Abstract: Methods and systems for calibrating the location of x-ray beam incidence onto a specimen in an x-ray scatterometry metrology system are described herein. The precise location of incidence of the illumination beam on the surface of the wafer is determined based on occlusion of the illumination beam by two or more occlusion elements. The center of the illumination beam is determined based on measured values of transmitted flux and a model of the interaction of the beam with each occlusion element. The position of the axis of rotation orienting a wafer over a range of angles of incidence is adjusted to align with the surface of wafer and intersect the illumination beam at the measurement location. A precise offset value between the normal angle of incidence of the illumination beam relative to the wafer surface and the zero angle of incidence as measured by the specimen positioning system is determined.

公开(公告)号：US20180113084A1

公开(公告)日：2018-04-26

申请号：US15789992

申请日：2017-10-21

Applicant: KLA-Tencor Corporation

Inventor： John Hench ,  Antonio Gellineau ,  Nikolay Artemiev ,  Joseph A. Di Regolo

IPC: G01N23/201 ,  G01N23/083

CPC classification number: G01N23/201 ,  G01N23/083 ,  G01N23/20083 ,  G01N2223/054 ,  G01N2223/303 ,  G21K1/067

Abstract: Methods and systems for calibrating the location of x-ray beam incidence onto a specimen in an x-ray scatterometry metrology system are described herein. The precise location of incidence of the illumination beam on the surface of the wafer is determined based on occlusion of the illumination beam by two or more occlusion elements. The center of the illumination beam is determined based on measured values of transmitted flux and a model of the interaction of the beam with each occlusion element. The position of the axis of rotation orienting a wafer over a range of angles of incidence is adjusted to align with the surface of wafer and intersect the illumination beam at the measurement location. A precise offset value between the normal angle of incidence of the illumination beam relative to the wafer surface and the zero angle of incidence as measured by the specimen positioning system is determined.

公开(公告)号：US20180328868A1

公开(公告)日：2018-11-15

申请号：US15974962

申请日：2018-05-09

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Nikolay Artemiev ,  Joseph A. Di Regolo ,  Antonio Gellineau ,  Alexander Kuznetsov ,  Andrei Veldman ,  John Hench

IPC: G01N23/201 ,  H01L21/67 ,  G01N23/205 ,  H01L21/68 ,  G01N23/207 ,  H01L21/687

CPC classification number: G01N23/201 ,  G01N23/205 ,  G01N23/207 ,  G01N2223/6116 ,  H01L21/67259 ,  H01L21/67282 ,  H01L21/67288 ,  H01L21/681 ,  H01L21/68764

Abstract: Methods and systems for positioning a specimen and characterizing an x-ray beam incident onto the specimen in a Transmission, Small-Angle X-ray Scatterometry (T-SAXS) metrology system are described herein. A specimen positioning system locates a wafer vertically and actively positions the wafer in six degrees of freedom with respect to the x-ray illumination beam without attenuating the transmitted radiation. In some embodiments, a cylindrically shaped occlusion element is scanned across the illumination beam while the detected intensity of the transmitted flux is measured to precisely locate the beam center. In some other embodiments, a periodic calibration target is employed to precisely locate the beam center. The periodic calibration target includes one or more spatially defined zones having different periodic structures that diffract X-ray illumination light into distinct, measurable diffraction patterns.