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1.发明申请METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE 有权通过使用饲料前进饲料的方法和测量细胞再次使用公开(公告)号：US20150112624A1
公开(公告)日：2015-04-23
申请号：US14588055
申请日：2014-12-31
Applicant: KLA-Tencor Corporation
Inventor： Michael Adel , Leonid Poslavsky , John Fielden , John Madsen , Robert Peters
IPC: H01L21/66
CPC classification number: H01L22/12 , H01L22/20 , H01L22/30 , H01L2924/0002 , H01L2924/00
Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
Abstract translation: 可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。
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2.发明授权Metrology through use of feed forward feed sideways and measurement cell re-use 有权通过使用前馈饲料进行横向计量和测量细胞再利用公开(公告)号：US09559019B2
公开(公告)日：2017-01-31
申请号：US14588055
申请日：2014-12-31
Applicant: KLA-Tencor Corporation
Inventor： Michael Adel , Leonid Poslavsky , John Fielden , John Madsen , Robert Peters
IPC: H01L21/66
CPC classification number: H01L22/12 , H01L22/20 , H01L22/30 , H01L2924/0002 , H01L2924/00
Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
Abstract translation: 可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。
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