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公开(公告)号：US20170178934A1
公开(公告)日：2017-06-22
申请号：US15261218
申请日：2016-09-09
Applicant: KLA-Tencor Corporation
Inventor： Brent A. Riggs , William Pierson
Abstract: Adaptive alignment methods and systems are disclosed. An adaptive alignment system may include a scanner configured to align a wafer and an analyzer in communication with the scanner. The analyzer may be configured to: recognize at least one defined analysis area; determine whether any perturbations exist within the analysis area; and in response to at least one perturbation determined to be within the analysis area, invoke a fall back alignment strategy or report the at least one perturbation to the scanner.
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公开(公告)号：US10707107B2
公开(公告)日：2020-07-07
申请号：US15261218
申请日：2016-09-09
Applicant: KLA-Tencor Corporation
Inventor： Brent A. Riggs , William Pierson
Abstract: Adaptive alignment methods and systems are disclosed. An adaptive alignment system may include a scanner configured to align a wafer and an analyzer in communication with the scanner. The analyzer may be configured to: recognize at least one defined analysis area; determine whether any perturbations exist within the analysis area; and in response to at least one perturbation determined to be within the analysis area, invoke a fall back alignment strategy or report the at least one perturbation to the scanner.
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3.发明申请公开(公告)号：US20180189964A1
公开(公告)日：2018-07-05
申请号：US15484961
申请日：2017-04-11
Applicant: KLA-Tencor Corporation
Inventor： Brent A. Riggs , Onur N. Demirer , William Pierson
Abstract: A system for determining a sample map for alignment measurements includes a metrology tool and a controller. The controller defines a full sampling map including a plurality of measurement locations. The controller directs the metrology tool to measure alignment at each measurement location of the full sampling map for a plurality of samples to generate a reference alignment dataset, generates candidate sampling maps, each being a subset of the full sampling map. The controller may further estimate alignment as a function of location based on the two or more candidate sampling maps at each measurement location of the full sampling map, and determine a working sampling map by comparing the estimated alignment to the reference alignment dataset and selecting the candidate sampling map having a smallest number of alignment estimates exceeding a selected tolerance.
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公开(公告)号：US10692227B2
公开(公告)日：2020-06-23
申请号：US15484961
申请日：2017-04-11
Applicant: KLA-Tencor Corporation
Inventor： Brent A. Riggs , Onur N. Demirer , William Pierson
Abstract: A system for determining a sample map for alignment measurements includes a metrology tool and a controller. The controller defines a full sampling map including a plurality of measurement locations. The controller directs the metrology tool to measure alignment at each measurement location of the full sampling map for a plurality of samples to generate a reference alignment dataset, generates candidate sampling maps, each being a subset of the full sampling map. The controller may further estimate alignment as a function of location based on the two or more candidate sampling maps at each measurement location of the full sampling map, and determine a working sampling map by comparing the estimated alignment to the reference alignment dataset and selecting the candidate sampling map having a smallest number of alignment estimates exceeding a selected tolerance.
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