Multi-Spot Illumination for Wafer Inspection
    1.
    发明申请
    Multi-Spot Illumination for Wafer Inspection 有权
    晶圆检测的多点照明

    公开(公告)号:US20130250582A1

    公开(公告)日:2013-09-26

    申请号:US13898470

    申请日:2013-05-21

    CPC classification number: F21V5/008 G01N21/8806 G01N21/9501 G01N21/9505

    Abstract: Illumination subsystems for multi-spot wafer inspection are provided. One illumination subsystem includes a diffractive optical element configured to separate an illumination light beam into multiple light beams and a refractive lens array positioned in the path of the multiple light beams. The refractive lens array is configured to relay the laser beam waist at the diffractive optical element onto a wafer surface and to separately and simultaneously focus each of the multiple light beams to a wafer for inspection.

    Abstract translation: 提供了多点晶圆检查的照明子系统。 一个照明子系统包括被配置为将照明光束分离成多个光束的衍射光学元件和位于多个光束的路径中的折射透镜阵列。 折射透镜阵列被配置为将衍射光学元件处的激光束腰部中继到晶片表面上,并且将多个光束中的每一个分别并且同时聚焦到晶片以进行检查。

    Multi-spot illumination for wafer inspection
    2.
    发明授权
    Multi-spot illumination for wafer inspection 有权
    多点照明用于晶圆检查

    公开(公告)号:US08879056B2

    公开(公告)日:2014-11-04

    申请号:US13898470

    申请日:2013-05-21

    CPC classification number: F21V5/008 G01N21/8806 G01N21/9501 G01N21/9505

    Abstract: Illumination subsystems for multi-spot wafer inspection are provided. One illumination subsystem includes a diffractive optical element configured to separate an illumination light beam into multiple light beams and a refractive lens array positioned in the path of the multiple light beams. The refractive lens array is configured to relay the laser beam waist at the diffractive optical element onto a wafer surface and to separately and simultaneously focus each of the multiple light beams to a wafer for inspection.

    Abstract translation: 提供了多点晶圆检查的照明子系统。 一个照明子系统包括被配置为将照明光束分离成多个光束的衍射光学元件和位于多个光束的路径中的折射透镜阵列。 折射透镜阵列被配置为将衍射光学元件处的激光束腰部中继到晶片表面上,并且将多个光束中的每一个分别并且同时聚焦到晶片以进行检查。

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