公开(公告)号：US09927371B2

公开(公告)日：2018-03-27

申请号：US14691966

申请日：2015-04-21

Applicant: KLA-Tencor Corporation

Inventor： Mark S. Wang ,  Chris Kirk ,  Andrey Kharisov

IPC: G01N21/00 ,  G01N21/88 ,  G02B21/00 ,  G02B21/36 ,  G01N21/95 ,  H01L21/66

CPC classification number: G01N21/8851 ,  G01N21/9501 ,  G01N2201/068 ,  G01N2201/10 ,  G01N2201/121 ,  G02B21/0028 ,  G02B21/0032 ,  G02B21/0072 ,  G02B21/365 ,  H01L22/12

Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.

公开(公告)号：US20150369750A1

公开(公告)日：2015-12-24

申请号：US14691966

申请日：2015-04-21

Applicant: KLA-Tencor Corporation

Inventor： Mark S. Wang ,  Chris Kirk ,  Andrey Kharisov

IPC: G01N21/88 ,  G01N21/95 ,  G02B21/00

CPC classification number: G01N21/8851 ,  G01N21/9501 ,  G01N2201/068 ,  G01N2201/10 ,  G01N2201/121 ,  G02B21/0028 ,  G02B21/0032 ,  G02B21/0072 ,  G02B21/365 ,  H01L22/12

Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.

Abstract translation: 线扫描晶片检查系统包括共焦狭缝孔径滤光器以去除旁瓣并增强扫描方向上的分辨率。 与狭缝孔径滤波器相关联的位置检测器监测和校正相对于狭缝孔径的照明线图像位置，以将图像位置变化保持在可容许的极限内。 每个检测器测量线路位置，然后使用线路位置信号在反馈回路中调整收集路径中的光学，机械和电子部件。 反馈回路可用于运行时校准过程或检查期间以增强稳定性。