Calibration Of Parametric Measurement Models Based On In-Line Wafer Measurement Data

    公开(公告)号:US20240102941A1

    公开(公告)日:2024-03-28

    申请号:US18244749

    申请日:2023-09-11

    CPC classification number: G01N21/9505 G01N21/31 G01N21/4738 G01N2201/127

    Abstract: Methods and systems for calibrating simulated measurement signals generated by a parametric measurement model are described herein. Regression on real measurement signals is performed using a parametric model. The residual fitting error between the real measurement signals and simulated measurement signals generated by the parametric model characterizes the error of the parametric model at each set of estimated values of the one or more floating parameters. Simulated measurement signals are generated by the parametric model at specified values of the floating parameters. A residual fitting error associated with the simulated measurement signals generated at the specified values of the floating parameters is derived from the residual fitting errors calculated by the regression on the real measurement signals. The simulated measurement signals are calibrated by adding the residual fitting error to the uncalibrated, simulated measurement signals. The calibrated, simulated measurement signals improve the accuracy of measurements and measurement recipe development.

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