Abstract:
Object of the present invention is to provide a thermal type infrared sensor and a method of manufacturing the same that degree of freedom of a structure is high and cost is low. An infrared ray detecting portion and a support leg are formed above a flat plate-shape void formed inside of a semiconductor substrate, and a processing circuit section of a signal from a detecting portion is fabricated on the semiconductor substrate. Because the structure of the processing circuit section is not influenced by a substrate structure, characteristics is improved. Furthermore, the structure is simplified, and it is possible to reduce a manufacturing cost.
Abstract:
An infrared image sensor encompasses (a) a base body, (b) a plurality of signal lines disposed on the base body, (c) a plurality of address lines intersecting the signal lines, (d) a plurality of detector portions provided in the cross region of the signal lines and the address lines, each of the detector portions being connected between the corresponding signal line and the address line, each of the detector portions is configured to detect infrared-ray, (e) a plurality of supporting beams supporting each of the detector portions above the base body, and (f) a plurality of contactors configured to contact each of the detector portions with the base body thermally so as to transport thermal energy to be accumulated in each of the detector portions toward the base body.
Abstract:
A supporting beam line for supporting, afloat in a cavity on a semiconductor substrate, an infrared detection pixel comprising an infrared absorption portion for absorbing an incident infrared ray and converting it into heat and a thermoelectric conversion portion for converting a temperature change caused by the heat generated in the infrared absorption portion into an electric signal is formed by a damascene metal on the same layer as the gate of a damascene metal gate MOS transistor to be used in a peripheral circuit. The supporting beam line comprises a conductor line with U-shaped cross section inside which a metal is filled.
Abstract:
A thermal type infrared ray imaging device has a plurality of cells arranged on a substrate each having a photothermal conversion part which converts an infrared ray into heat, and a thermoelectric conversion part which is provided below the photothermal conversion part and which converts the heat generated by the photothermal conversion part into an electric signal, a selection part which selects some cells among the plurality of cells, and an output part which outputs the electric signal generated by the thermoelectric conversion part of the selected cells. The photothermal conversion part includes a first photothermal conversion layer and a second photothermal conversion layer provided over and apart from the first photothermal conversion layer, which converts an infrared ray within a waveband different from the waveband of the first photothermal conversion layer into heat. The thermoelectric conversion part includes a first thermoelectric conversion part which converts the heat generated by the first photothermal conversion layer into the electric signal and a second thermoelectric conversion part which is thermally separated from the first thermoelectric conversion part, and which converts the heat generated by the second photothermal conversion layer into the electric signal.
Abstract:
An infrared sensor including a substrate, a plurality of infrared detection pixels arrayed on a substrate with each of the infrared detection pixels including an infrared absorption portion formed over the substrate and configured to absorb infrared radiation, a thermoelectric converter portion formed over the substrate and configured to convert a temperature change in the infrared absorption portion into an electrical signal, and support structures configured to support the thermoelectric converter portion and the infrared absorption portion over the substrate via a separation space, the support structures having conductive interconnect layers configured to deliver the electrical signal from the thermoelectric converter portion to the substrate. The infrared sensor further includes a pixel selection circuit configured to select at least one of the infrared detection pixels which delivers the electrical signal and an output circuit configured to output the electrical signal delivered from selected infrared detection pixels via the conductive interconnect layers. The conductive interconnect layers include a material the same as a material of gate layers of the MOS transistors, and have a thickness similar to the gate layers.
Abstract:
An object of the present invention is to provide a high-sensitivity infrared sensor. According to the present invention, a support member for supporting a sensor portion in a cavity structure is formed to be remarkably thin as compared with a conventional structure, a sectional area of the support member is considerably reduced, heat conductance can remarkably be reduced and, as a result, the infrared sensor having a remarkably high sensitivity can be obtained. Moreover, according to the present invention, since an insulating layer of a support member area is etched, and a sacrifice silicon film is embedded in the area, an aspect ratio of an insulating layer RIE for forming a support leg is remarkably reduced. A manufacturing process is facilitated, a sectional area of the support leg is further reduced as a secondary effect, and the sensitivity of the infrared sensor can further be enhanced.