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1.发明授权Mass production of secondary metabolite in plant cell culture by treatment of saccharide mixture in medium 有权通过处理培养基中的糖混合物，在植物细胞培养中大量生产次生代谢物公开(公告)号：US08936940B2
公开(公告)日：2015-01-20
申请号：US11915869
申请日：2006-06-02
Applicant: Jin-Ah Kim , Chang-Heon Kim , Jai-Young Song , Ho-Joon Choi
Inventor： Jin-Ah Kim , Chang-Heon Kim , Jai-Young Song , Ho-Joon Choi
CPC classification number: C12N5/0025 , C12N1/38 , C12P17/02
Abstract: The present invention relates to a method of producing secondary metabolites with a high yield using plant cell culture, and a medium for the production of secondary metabolites. More specifically, the method of the present invention is characterized in that the plant cell culture is conducted by adding a saccharide mixture to the culture medium as a carbon source, to increase the productivity of the secondary metabolites. For example, the present invention establishes the method of increasing the productivity of secondary metabolites and shortening the culture time by the use of the mixture of glucose and fructose in the plant cell culture, thereby contributing in producing useful secondary metabolites on an industrial scale using plant cell culture.
Abstract translation: 本发明涉及使用植物细胞培养物产生高产率的次级代谢产物的方法和用于生产次级代谢产物的培养基。 更具体地说，本发明的方法的特征在于，通过向作为碳源的培养基中添加糖混合物来进行植物细胞培养，以提高次级代谢物的生产率。 例如，本发明建立了通过在植物细胞培养物中使用葡萄糖和果糖的混合物来提高次级代谢产物的生产率并缩短培养时间的方法，从而有助于在工业规模上使用植物生产有用的次级代谢物 细胞培养。
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2.发明授权公开(公告)号：US08101411B2
公开(公告)日：2012-01-24
申请号：US11993316
申请日：2006-06-30
Applicant: Chang-Heon Kim , Jin-Ah Kim , Jai-Young Song , Ho-Joon Choi
Inventor： Chang-Heon Kim , Jin-Ah Kim , Jai-Young Song , Ho-Joon Choi
Abstract: The present invention relates to a method of producing corosolic acid by using plant cells that produce corosolic acid. More particularly, the present invention relates to a method of producing corosolic acid by using plant cell suspension cultures comprising the steps of: inducing a callus from a tissue of a plant producing corosolic acid; preparing a cell line capable of being cultured in liquid culture medium from the induced callus; culturing the cell line in a suspension culture; and isolating corosolic acid from the culture solution. The present invention has advantage of maximizing productivity by utilizing two-stage culture, treatment with inducing agent, and high cell-density culture in the suspension culture of plant cells producing corosolic acid.
Abstract translation: 本发明涉及通过使用产生科罗索酸的植物细胞来生产科罗索酸的方法。 更具体地，本发明涉及通过使用植物细胞悬浮培养物生产科罗索酸的方法，包括以下步骤：从产生科罗索酸的植物的组织诱导愈伤组织; 制备能够从诱导愈伤组织在液体培养基中培养的细胞系; 在悬浮培养中培养细胞系; 并从培养液中分离出科罗索酸。 本发明具有通过利用两阶段培养，诱导剂处理以及在产生科罗索酸的植物细胞的悬浮培养中的高细胞密度培养来最大化生产率的优点。
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3.发明申请MASS PRODUCTION OF SECONDARY METABOLITE IN PLANT CELL CULTURE BY TREATMENT OF SACCHARIDE MIXTURE IN MEDIUM 有权通过处理中等浓度的混合物在植物细胞培养中大量生产次生代谢物公开(公告)号：US20090317877A1
公开(公告)日：2009-12-24
申请号：US11915869
申请日：2006-06-02
Applicant: Jin-Ah Kim , Chang-Heon Kim , Jai-Young Song , Ho-Joon Choi
Inventor： Jin-Ah Kim , Chang-Heon Kim , Jai-Young Song , Ho-Joon Choi
IPC: C12P17/02
CPC classification number: C12N5/0025 , C12N1/38 , C12P17/02
Abstract: The present invention relates to a method of producing secondary metabolites with a high yield using plant cell culture, and a medium for the production of secondary metabolites. More specifically, the method of the present invention is characterized in that the plant cell culture is conducted by adding a saccharide mixture to the culture medium as a carbon source, to increase the productivity of the secondary metabolites. For example, the present invention establishes the method of increasing the productivity of secondary metabolites and shortening the culture time by the use of the mixture of glucose and fructose in the plant cell culture, thereby contributing in producing useful secondary metabolites on an industrial scale using plant cell culture.
Abstract translation: 本发明涉及使用植物细胞培养物产生高产率的次级代谢产物的方法和用于生产次级代谢产物的培养基。 更具体地说，本发明的方法的特征在于，通过向作为碳源的培养基中添加糖混合物来进行植物细胞培养，以提高次级代谢物的生产率。 例如，本发明建立了通过在植物细胞培养物中使用葡萄糖和果糖的混合物来提高次级代谢产物的生产率并缩短培养时间的方法，从而有助于在工业规模上使用植物生产有用的次级代谢物 细胞培养。
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4.发明申请Template, method of forming the template and method of forming a pattern on a semiconductor device using the template 审中-公开模板，形成模板的方法和使用该模板在半导体器件上形成图案的方法公开(公告)号：US20050158637A1
公开(公告)日：2005-07-21
申请号：US11037805
申请日：2005-01-18
Applicant: Jin-Ah Kim , Dong-Seok Nam , Jung-Hwan Hah
Inventor： Jin-Ah Kim , Dong-Seok Nam , Jung-Hwan Hah
IPC: H01L21/027 , G03C5/00 , G03F7/00 , G03F9/00
CPC classification number: B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015
Abstract: A template, a method of forming the template and a method of forming a photoresist pattern using a lithographic template is disclosed. In the method, a photoresist film is formed on a substrate. A template for selectively transmitting light is pressed on the photoresist film. The template includes a transparent plate through which light passes, a blocking pattern formed thereon for selectively blocking the light passing through the transparent plate, and a plurality of concave and convex portions for imprinting the photoresist film. The concave and convex portions are formed in accordance with the blocking pattern. The photoresist film is partially exposed to light selectively passing through the template, and the photoresist film that has been exposed to the light is also partially developed to form the photoresist pattern.
Abstract translation: 公开了模板，形成模板的方法和使用光刻模板形成光致抗蚀剂图案的方法。 在该方法中，在基板上形成光致抗蚀剂膜。 用于选择性透射光的模板被压在光致抗蚀剂膜上。 模板包括光通过的透明板，形成在其上的阻挡图案，用于选择性地阻挡穿过透明板的光，以及多个用于压印光致抗蚀剂膜的凹凸部分。 根据阻挡图案形成凹凸部。 光致抗蚀剂膜部分地暴露于选择性地通过模板的光，并且已经暴露于光的光致抗蚀剂膜也被部分显影以形成光致抗蚀剂图案。
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