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公开(公告)号：US12106949B2
公开(公告)日：2024-10-01
申请号：US17598473
申请日：2019-09-20
发明人： Yuki Furuya
CPC分类号： H01J37/3429 , B22F3/10 , C22C5/04 , C22C19/07 , C22C30/00 , C22C32/0015 , C23C14/3414 , B22F2301/15 , B22F2301/25 , C22C2202/02
摘要： Provided is a sputtering target capable of reducing generation of particles, and a method for producing the same. The sputtering target includes: 10 mol % or more and 85 mol % or less of Co, 0 mol % or more and 47 mol % or less of Pt, and 0 mol % or more and 47 mol % or less of Cr, as metal components; and at least B6O as an oxide component.
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公开(公告)号：US20190106783A1
公开(公告)日：2019-04-11
申请号：US16089454
申请日：2017-03-23
发明人： Yuki Furuya
摘要： Provided is an oxide grain-dispersed ferromagnetic material sputtering target having a fine structure which can effectively reduce abnormal discharge and generation of particles caused by oxide grains. A sintered sputtering target contains, as metal or an alloy, 0 mol % or more and 45 mol % or less of Pt, 55 mol % or more and 95 mol % or less of Co, and 0 mol % or more and 40 mol % or less of Cr; and further contains at least two kinds of oxides. The oxides are present in the metal or alloy, and the standard deviation of the number density of oxides is 2.5 or less.
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公开(公告)号：US20220189750A1
公开(公告)日：2022-06-16
申请号：US17598473
申请日：2019-09-20
发明人： Yuki Furuya
摘要： Provided is a sputtering target capable of reducing generation of particles, and a method for producing the same. The sputtering target includes: 10 mol % or more and 85 mol % or less of Co, 0 mol % or more and 47 mol % or less of Pt, and 0 mol % or more and 47 mol % or less of Cr, as metal components; and at least B6O as an oxide component.
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