公开(公告)号：US10520815B2

公开(公告)日：2019-12-31

申请号：US15460503

申请日：2017-03-16

申请人： JSR CORPORATION

发明人： Takehiko Naruoka ,  Tomohisa Fujisawa ,  Motohiro Shiratani ,  Hisashi Nakagawa

IPC分类号： G03F7/004 ,  G03F7/30 ,  G03F7/20 ,  G03F7/038 ,  G03F7/16 ,  G03F7/32 ,  H01L21/027

摘要： A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.