公开(公告)号：US20230112460A1

公开(公告)日：2023-04-13

申请号：US17498997

申请日：2021-10-12

Applicant: Inuitive Ltd.

Inventor： Pavel GRINBERG ,  Alan GELLER ,  Mishel IVGI

IPC: G02B19/00 ,  G02B5/00

Abstract: A pattern projector is disclosed. The pattern projector comprises a light source, a projection lens, a mask and configured to enable the at least one projection lens to illuminate a target while projecting the pre-defined pattern thereat, and at least one holder, and wherein the pattern projector is characterized in that the at least one light source is a wide area light source, and wherein the area of the at least one mask or the at least one mask active area, is smaller than the area of the at least one light source, enabling to refrain from applying condenser optics or focusing optics between the at least one light source and the at least one mask.