公开(公告)号：US08604453B2

公开(公告)日：2013-12-10

申请号：US13904731

申请日：2013-05-29

Applicant: Gigaphoton Inc.

Inventor： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC: H05G2/00

CPC classification number: G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

Abstract translation: 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。