公开(公告)号：US20240173796A1

公开(公告)日：2024-05-30

申请号：US18399043

申请日：2023-12-28

Applicant: Gigaphoton Inc.

Inventor： Yasufumi KAWASUJI ,  Yasuhiro ADACHI ,  Akira SUWA

IPC: B23K26/066 ,  H01L21/48 ,  H01L23/00

CPC classification number: B23K26/066 ,  H01L21/481 ,  H01L24/16 ,  H01L2224/16225

Abstract: A laser processing apparatus forms a hole in a workpiece having a resin layer on a processing surface by irradiating the workpiece with a laser beam discharge-excited between a pair of discharge electrodes, and includes a laser apparatus that outputs the laser beam having a first divergence angle in a discharge direction between the pair of discharge electrodes larger than a second divergence angle in a direction perpendicular to the discharge direction and a laser beam traveling direction, a transfer mask that forms a transfer pattern, an introducing optical system for guiding the laser beam to the transfer mask, a projection optical system that images the transfer pattern on the resin layer, and a divergence angle adjusting optical system that is disposed on an optical path of the laser beam and adjusts a difference between the first divergence angle and the second divergence angle to be reduced.

公开(公告)号：US20230219171A1

公开(公告)日：2023-07-13

申请号：US18180495

申请日：2023-03-08

Applicant: Gigaphoton Inc.

Inventor： Yasufumi KAWASUJI ,  Akira SUWA ,  Yasuhiro ADACHI

IPC: B23K26/382 ,  H01S3/225 ,  G02F1/35 ,  H01S3/109 ,  H01S3/00 ,  B23K26/0622 ,  B23K26/402 ,  C03B33/08

CPC classification number: B23K26/382 ,  H01S3/2256 ,  G02F1/354 ,  H01S3/109 ,  H01S3/0057 ,  B23K26/0622 ,  B23K26/402 ,  C03B33/082 ,  B23K2103/54

Abstract: A glass processing method according to a viewpoint of the present disclosure includes generating a pulse laser beam by using a laser oscillator, and irradiating alkali-free glass to be processed with the pulse laser beam. The wavelength of the pulse laser beam ranges from 248 nm to 266 nm, and the pulse laser beam has an energy ratio greater than or equal to 91% but smaller than or equal to 99% in the region from 5 ns after a pulse rises to 400 ns.