SYSTEM AND METHOD FOR DETERMINING X-RAY EXPOSURE PARAMETERS
    2.
    发明申请
    SYSTEM AND METHOD FOR DETERMINING X-RAY EXPOSURE PARAMETERS 有权
    用于确定X射线曝光参数的系统和方法

    公开(公告)号:US20150359502A1

    公开(公告)日:2015-12-17

    申请号:US14552546

    申请日:2014-11-25

    Abstract: In accordance with one aspect of the present system, a dual energy X-ray imaging system includes a communication module configured to receive a pre-shot image from a detection circuitry and receive one or more pre-shot parameters from a source controller of the dual energy X-ray imaging system. The dual energy X-ray imaging system further includes an analysis module configured to determine one or more image characteristics of the pre-shot image. The dual energy X-ray imaging system further includes a determination module configured to calculate a first and a second set of main-shot parameters based on the one or more pre-shot parameters and the one or more image characteristics of the pre-shot image. The determination module is further configured to send the one or more main-shot parameters to the source controller of the dual energy X-ray imaging system.

    Abstract translation: 根据本系统的一个方面,双能量X射线成像系统包括通信模块,该通信模块被配置为从检测电路接收预发射图像,并且从双重能量的源控制器接收一个或多个预注射参数 能量X射线成像系统。 双能量X射线成像系统还包括分析模块,其被配置为确定预拍摄图像的一个或多个图像特征。 双能量X射线成像系统还包括确定模块,其被配置为基于一个或多个预拍摄参数和预拍摄图像的一个或多个图像特征来计算第一和第二组主要拍摄参数集 。 确定模块还被配置为将一个或多个主要参数发送到双能量X射线成像系统的源控制器。

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