Mask exposure method, transparent conductive metallization and pigment

    公开(公告)号:US12128704B2

    公开(公告)日:2024-10-29

    申请号:US18263787

    申请日:2022-01-10

    摘要: The invention relates to a mask exposure method comprising the following steps: —the providing of a carrier substrate; the print application of a radiation-crosslinkable washable dye layer to the full area of the carrier substrate; —the exposure of the radiation-crosslinkable washable dye layer in defined regions to radiation by means of a radiation mask, such that the washable dye is cured in the defined regions; —the applying of a metallization over the full area; —the removing of the non-radiation-exposed washable dye outside the defined regions together with the metal present thereon with the aid of a solvent, such that the resultant carrier substrate has cured washable dye with metal applied thereto only in defined regions.

    Security element having a lenticular image

    公开(公告)号:US11110734B2

    公开(公告)日:2021-09-07

    申请号:US16061191

    申请日:2016-12-12

    摘要: A security element for securing security papers, value documents and other data carriers, having a lenticular image that, from different viewing directions, displays at least two different appearances. The lenticular image includes a lens grid composed of a plurality of microlenses and a radiation-sensitive motif layer arranged spaced apart from the lens grid. The radiation-sensitive motif layer includes, produced by the action of radiation, a plurality of transparency regions that are each arranged in perfect register with the microlenses of the lens grid. Outside the transparency regions produced by the action of radiation, the radiation-sensitive motif layer is opaque and patterned in the form of a first motif such that, when the security element is viewed through the lens grid from a first viewing direction, the first motif is visible as the first appearance.

    Method for manufacturing a security element having a lens grid image

    公开(公告)号:US11040565B2

    公开(公告)日:2021-06-22

    申请号:US16469036

    申请日:2017-12-15

    摘要: A method includes using a lenticular image having a lens grid composed of a plurality of microlenses and a metallic motif layer arranged spaced apart from the lens grid; the refractive effect of the microlenses defines a focal plane and the metallic motif layer being arranged substantially in the focal plane; a line width is chosen for the demetalized sub-regions to be produced in the metallic motif layer; a marking laser source having a laser wavelength λ is selected such that the resolving power D(λ) of the microlenses of the lenticular image at the selected laser wavelength λ substantially corresponds to the line width of the demetalized sub-regions to be produced; and the metallic motif layer is impinged on through the microlenses with laser radiation of the marking laser source to produce demetalized sub-regions in the metallic motif layer.