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1.发明申请Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method 失效激光装置，曝光头，曝光装置和光纤连接方法公开(公告)号：US20040022503A1
公开(公告)日：2004-02-05
申请号：US10409675
申请日：2003-04-09
IPC分类号： G02B006/255
CPC分类号： G02B6/4249 , G02B6/04 , G02B6/08 , G02B6/2551 , G02B6/4206 , G02B6/425 , H01S3/06708 , H01S3/06745
摘要： An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
摘要翻译： 束状纤维光源的光纤是芯直径均匀但发射端包层直径比其入射端包层直径小的光纤，其发光区域变小。 来自通过透镜系统并入射到DMD上的该较高亮度束状光纤光源的光通量的角度较小，即使照明NA更小。 因此，入射在要曝光的表面上的通量角较小。 也就是说，可以在不增加图像形成NA的情况下获得微小的图像形成光束，焦点深度被延长。
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公开(公告)号：US20030226834A1
公开(公告)日：2003-12-11
申请号：US10456741
申请日：2003-06-09
发明人： Hiromi Ishikawa , Akinori Harada , Kazuhiko Nagano , Yoji Okazaki , Takeshi Fujii , Hideo Yamanaka , Hiromitsu Yamakawa
IPC分类号： B23K026/00 , H01L021/00 , H01L021/84
CPC分类号： B23K26/0608 , B23K26/0604 , C23C14/28 , C23C16/483
摘要： A laser annealer has a laser light source with at least one GaN-type semiconductor laser and is configured so as to form emission points that emit laser beams having a wavelength of 350 to 450 nm, and a scanning device for scanning an annealing surface with the laser beams. The laser annealer may have a spatial light modulator for modulating the laser beams, and in which pixel portions whose light modulating states change in accordance with control signals are arranged on a substrate. The invention is applied to a laser thin-film forming apparatus. The apparatus has a laser source that has at least one semiconductor laser and is configured so as to form emission points, and an optical system for focusing laser beams into a single beam in the width direction of a substrate.
摘要翻译： 激光退火炉具有具有至少一个GaN型半导体激光器的激光光源，并且被配置为形成发射波长为350至450nm的激光束的发射点，以及用于扫描退火表面的扫描装置 激光束。 激光退火炉可以具有用于调制激光束的空间光调制器，并且其中光调制状态根据控制信号改变的像素部分被布置在基板上。 本发明应用于激光薄膜形成装置。 该装置具有至少一个半导体激光器并且被配置为形成发射点的激光源，以及用于将激光束在基板的宽度方向上聚焦成单个光束的光学系统。
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公开(公告)号：US20030214571A1
公开(公告)日：2003-11-20
申请号：US10409686
申请日：2003-04-09
IPC分类号： B41J002/47
CPC分类号： B41J2/451 , B23K26/0604 , B23K26/066 , B29C64/135 , B29C64/153 , B33Y30/00 , B41J2/45 , B41J2/465 , B41J2/47 , D06L4/50 , D06M10/005 , G02B26/0841 , G03F7/7005 , G03F7/70291 , H04N1/12 , H04N1/191 , H04N1/1916
摘要： In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost. Since the number of optical fibers is few, the light-emitting region is further decreased when the optical fibers are arrayed.
摘要翻译： 在本发明的曝光装置中，对于空间光调制器，利用根据曝光信息生成的控制信号来控制少于像素部分总数的多个像素部分中的每一个。 即，在不控制基板上的整个像素部分的情况下，控制像素部分的一部分。 因此，像素部分中的像素数量减少，并且控制信号的传送时间变短。 这使得能够增加激光束的调制速度并执行高速曝光。 其中激光束并入并撞击在光纤上的并入的激光光源优于激光装置。 通过采用所结合的激光光源，可以获得高亮度和高输出，并且优选空间光调制器的曝光。 由于光纤阵列获得的光纤很少，所以成本低。 由于光纤的数量少，所以在配置光纤时，发光区域进一步降低。
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4.发明申请公开(公告)号：US20040247011A1
公开(公告)日：2004-12-09
申请号：US10444084
申请日：2003-05-23
IPC分类号： H01S003/08
CPC分类号： H01S5/4031 , G02B19/0014 , G02B19/0057 , G02B19/0095 , G02B27/0961 , H01S5/005 , H01S5/02248 , H01S5/02284 , H01S5/4012 , H04N1/06 , H04N1/0678 , H04N1/1911
摘要： A condensing lens is integrally formed with collimator-lens portions which respectively collimate light beams and a condensing lens portion which makes the collimated light beams converge at a common point. In addition, an optically-multiplexed-laser-light source is constituted by semiconductor lasers, a multimode optical fiber, and the above condensing lens, where the collimator-lens portions in the condensing lens are respectively arranged in correspondence with the semiconductor lasers, and the condensing lens portion couples the light beams collimated by the collimator-lens portions, to the multimode optical fiber.
摘要翻译： 聚光透镜与准直透镜部分一体地形成，该准直透镜部分分别准直光束，并使聚光透镜部分使准直光束在共同点处会聚。 此外，光复用激光光源由半导体激光器，多模光纤和上述聚光透镜构成，其中聚光透镜中的准直透镜部分分别对应于半导体激光器布置，以及 聚光透镜部分将由准直透镜部分准直的光束耦合到多模光纤。
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5.发明申请公开(公告)号：US20030218805A1
公开(公告)日：2003-11-27
申请号：US10396789
申请日：2003-03-25
IPC分类号： G02B013/08
CPC分类号： G02B13/08 , G02B3/06 , G02B27/0911
摘要： Provided are an optical correcting system which can form a linear image or illuminating light having a substantially uniform light intensity distribution without reducing the efficiency of use of light, and an exposure head which can perform excellent exposure by using the linear image or the illuminating light. Light flux from a light source is collimated by the function of a collimator lens, and the collimated light flux enters into an optical correcting system for correcting light intensity distribution. The optical correcting system for correcting light intensity distribution changes the width of the light flux at the exit position at which each collimated light flux exits so that the light intensity distribution of a linear image is uniform when the collimated light flux is formed into the linear image. A change of the widths of the light flux allows utilizing the light flux at the midsection generally having a high light intensity distribution for the peripheral having an insufficient light intensity, thereby uniformalizing the light intensity distribution of the linear image without reducing the efficiency of use of light as a whole.
摘要翻译： 提供了一种光学校正系统，其可以形成具有基本上均匀的光强度分布的线性图像或照明光，而不降低光的使用效率;以及可以通过使用线性图像或照明光来实现优异曝光的曝光头。 来自光源的光束通过准直透镜的功能被准直，并且准直光束进入用于校正光强度分布的光学校正系统。 用于校正光强度分布的光学校正系统改变在每个准直光束出射的出射位置处的光束的宽度，使得当准直光束形成线性图像时线性图像的光强度分布是均匀的 。 光通量宽度的变化允许利用通常具有高光强度分布的中部的光通量，对于具有不足的光强度的外围设备，从而使线性图像的光强度分布均匀化，而不降低使用效率 整体光。
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