公开(公告)号：US20250095959A1

公开(公告)日：2025-03-20

申请号：US18369967

申请日：2023-09-19

Applicant: FEI Company

Inventor： Chad Rue ,  Lilly Landers ,  Jason Arjavac ,  Gavin Mitchson

IPC: H01J37/305

Abstract: Methods include conditioning at least a portion of a gas delivery system with a carbon-based conditioning agent to provide a carbon-based residual, and etching a substrate with a focused ion beam, in the presence of an ammonia-based delayering agent provided by the gas delivery system and in the presence of the carbon-based residual, wherein the carbon-based residual reduces a topographical variation of a depth of the etching. Apparatus include a focused ion beam system configured to deliver a focused ion beam to a sample, and a pre-conditioned gas delivery system configured to deliver an ammonia-based delayering agent to the sample at least while the focused ion beam is being delivered to the sample, wherein the pre-conditioned gas delivery system includes a carbon-based residual in the gas delivery system, wherein a portion of the carbon-based residual is present at the sample during the etching of the sample with the ammonia-based delayering agent.