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Patent Agency Ranking
公开(公告)号：US11134837B2
公开(公告)日：2021-10-05
申请号：US16333527
申请日：2017-09-14
Applicant: Essilor International
Inventor： Pascal Allione , Thierry Bonnin , Jean Sahler , Stéphane Gueu , Sébastien Maurice
Abstract: Disclosed is a method for determining an updated visual correction need for designing a new vision correcting device of an individual already having a previous vision correcting device previously designed to correct his/her vision, wherein, in a first step, a previous level of correction of the previous vision correcting device is acquired, in a second step, a current vision acuity parameter of the individual wearing the previous vision correcting device is assessed, and, in a third step, the updated visual correction need is determined based on the previous level of correction of the previous vision correcting device acquired in the first step and on the current vision acuity parameter assessed in the second step. A complementary visual correction need can also be determined.
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2.发明授权公开(公告)号：US11326980B2
公开(公告)日：2022-05-10
申请号：US16071844
申请日：2016-02-22
Applicant: ESSILOR INTERNATIONAL
Inventor： Dominick Hubacz , Stéphane Gueu
Abstract: Disclosed is a method for determining a parameter of an optical device including at least an optical lens, the method including: an optical system providing step, during which an optical system including a visual target, the optical device and an image acquisition module is provided in an initial configuration state, a parameter determining step during which a parameter of the optical device is determined based on the blur level of the images of the visual target acquired by the image acquisition module through the optical device in at least two different configuration states.
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3.发明申请公开(公告)号：US20150055126A1
公开(公告)日：2015-02-26
申请号：US14384119
申请日：2013-03-08
Inventor： Stéphane Gueu , Nicolas La Villonniere , Fabien Muradore , Asma Lakhoua
IPC: G01M11/02
CPC classification number: G01M11/025 , G01B11/24 , G01M11/0264 , G01M11/0271
Abstract: The subject of the present invention is a method and a system for measuring the geometric or optical structure of an optical component. In particular, the invention relates to a method for measuring the geometric structure of a component bounded by a first side (10) and a second side (20), said method comprising steps of: (S1) measuring a first signal (MS1) resulting from a first conversion of a first probe signal (PS1), by at least said first side (10); (S2) measuring a second signal (MS2) resulting from a second conversion of a second probe signal (PS2), by at least said second side (20); (S3) determining a third conversion making it possible to convert a first set of coordinates (R1) associated with the measurement of the first signal (MS1) to a second set of coordinates (R2) associated with the measurement of the second signal (MS2); (S10) estimating said first side (10) using the first signal (MS1), said first simulation and a first cost criterion (V1) quantifying a difference between the estimation (FS1) and the first signal (MS1); and (S20) estimating said second side (20) using the second signal (MS2), said second simulation, said third conversion and a second cost criterion (V2) quantifying a difference between the estimation (ES2) and the second signal (MS2).
Abstract translation: 本发明的主题是用于测量光学部件的几何或光学结构的方法和系统。 特别地，本发明涉及一种用于测量由第一侧（10）和第二侧（20）界定的部件的几何结构的方法，所述方法包括以下步骤：（S1）测量产生的第一信号（MS1） 至少所述第一侧（10）从第一探测信号（PS1）的第一转换开始。 （S2）通过至少所述第二侧（20）测量由第二探测信号（PS2）的第二转换产生的第二信号（MS2）; （S3）确定第三转换，使得可以将与第一信号（MS1）的测量相关联的第一组坐标（R1）转换为与第二信号（MS2）的测量相关联的第二坐标系（R2） ）; （S10）使用第一信号（MS1），所述第一模拟和量化估计（FS1）与第一信号（MS1）之间的差的第一成本标准（V1））来估计所述第一侧（10） 以及（S20）使用第二信号（MS2），所述第二模拟，所述第三转换和第二成本标准（V2）估计所述第二侧（20），以及量化估计（ES2）和第二信号（MS2）之间的差的第二成本标准 。
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公开(公告)号：US11531217B2
公开(公告)日：2022-12-20
申请号：US16340808
申请日：2017-10-05
Applicant: ESSILOR INTERNATIONAL
Inventor： Thierry Bonnin , Pascal Allione , Jean Sahler , Stéphane Gueu , Sébastien Maurice
Abstract: Disclosed is a method for determining a parameter of an optical equipment including an optical lens including permanent markings and being mounted in a spectacle frame, including: positioning the optical equipment is before a pattern in a first position; positioning a portable electronic device including an image acquisition module in a second position so as to acquire an image showing together the pattern seen through at least part of the optical lenses of the optical equipment in the first position and at least part of the spectacle frame of the optical equipment in the first position; detecting the permanent marking on the optical lens using the image acquired by the image acquisition module of the portable electronic device in the second position; and determining at least one parameter of the optical equipment based on the position of the permanent marking.
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5.发明授权公开(公告)号：US09109976B2
公开(公告)日：2015-08-18
申请号：US14384119
申请日：2013-03-08
Inventor： Stéphane Gueu , Nicolas La Villonniere , Fabien Muradore , Asma Lakhoua
CPC classification number: G01M11/025 , G01B11/24 , G01M11/0264 , G01M11/0271
Abstract: The subject of the present invention is a method and a system for measuring the geometric or optical structure of an optical component. In particular, the invention relates to a method for measuring the geometric structure of a component bounded by a first side (10) and a second side (20), said method comprising steps of: (S1) measuring a first signal (MS1) resulting from a first conversion of a first probe signal (PS1), by at least said first side (10); (S2) measuring a second signal (MS2) resulting from a second conversion of a second probe signal (PS2), by at least said second side (20); (S3) determining a third conversion making it possible to convert a first set of coordinates (R1) associated with the measurement of the first signal (MS1) to a second set of coordinates (R2) associated with the measurement of the second signal (MS2); (S10) estimating said first side (10) using the first signal (MS1), said first simulation and a first cost criterion (V1) quantifying a difference between the estimation (FS1) and the first signal (MS1); and (S20) estimating said second side (20) using the second signal (MS2), said second simulation, said third conversion and a second cost criterion (V2) quantifying a difference between the estimation (ES2) and the second signal (MS2).
Abstract translation: 本发明的主题是用于测量光学部件的几何或光学结构的方法和系统。 特别地，本发明涉及一种用于测量由第一侧（10）和第二侧（20）界定的部件的几何结构的方法，所述方法包括以下步骤：（S1）测量产生的第一信号（MS1） 至少所述第一侧（10）从第一探测信号（PS1）的第一转换开始。 （S2）通过至少所述第二侧（20）测量由第二探测信号（PS2）的第二转换产生的第二信号（MS2）; （S3）确定第三转换，使得可以将与第一信号（MS1）的测量相关联的第一组坐标（R1）转换为与第二信号（MS2）的测量相关联的第二坐标系（R2） ）; （S10）使用第一信号（MS1），所述第一模拟和量化估计（FS1）与第一信号（MS1）之间的差的第一成本标准（V1））来估计所述第一侧（10） 以及（S20）使用第二信号（MS2），所述第二模拟，所述第三转换和第二成本标准（V2）估计所述第二侧（20），以及量化估计（ES2）和第二信号（MS2）之间的差的第二成本标准 。
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