公开(公告)号：US20150287570A1

公开(公告)日：2015-10-08

申请号：US14677086

申请日：2015-04-02

Applicant: EBARA CORPORATION

Inventor： Takehide HAYASHI ,  Masahiro HATAKEYAMA ,  Shinji YAMAGUCHI ,  Masato NAKA

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/185 ,  H01J37/222 ,  H01J37/224 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: An inspection apparatus includes beam generation means, a primary optical system, a secondary optical system and an image processing system. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted from the inspection object as the secondary charged particles due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction and a lens that forms an image of the secondary charged particles that have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image.

Abstract translation: 检查装置包括光束产生装置，主光学系统，二次光学系统和图像处理系统。 光束的照射能量被设定在能够从作为二次带电粒子的检查对象射出的电子束照射的能量区域。 二次光学系统包括用于检测二次带电粒子的相机，其位置沿着光轴方向可调节的数值孔径，以及形成已经通过数字孔径的图像上的次级带电粒子的图像的透镜， 相机。 在图像处理系统中，图像形成在孔径成像条件下，其中数值孔径的位置位于物体表面上以获取图像。

公开(公告)号：US20160322192A1

公开(公告)日：2016-11-03

申请号：US15147356

申请日：2016-05-05

Applicant: EBARA CORPORATION

Inventor： Takehide HAYASHI ,  Masahiro HATAKEYAMA ,  Shinji YAMAGUCHI ,  Masato NAKA

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/185 ,  H01J37/222 ,  H01J37/224 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: An inspection apparatus includes beam generation means, a primary optical system, a secondary optical system and an image processing system. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted from the inspection object as the secondary charged particles due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction and a lens that forms an image of the secondary charged particles that have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image.