Photopolymerizable compositions and elements and uses thereof
    1.
    发明授权
    Photopolymerizable compositions and elements and uses thereof 失效
    光聚合组合物及其元素及其用途

    公开(公告)号:US3833384A

    公开(公告)日:1974-09-03

    申请号:US34857873

    申请日:1973-04-06

    申请人: EASTMAN KODAK CO

    摘要: Novel photopolymerizable compositions comprise an ethylenically unsaturated monomer which is a bisacryloyl derivative of p- or mhydroxy or amino benzoic acid, a film-forming carboxylated polymeric binder and a photoactivatable polymerization initiator. These compositions are easily developed with alkaline solutions and can be used to prepare resists, printing plates, and other photomechanical images. Terpolymer binders of methyl methacrylate, ethyl acrylate and methacrylic acid present in proportions of from 40 to 65 percent, 20 to 45 percent and 10 to 25 percent, respectively, on a mole basis, have been found to produce resist compositions of exceptionally clean developing characteristics which are substantially free of microresidues.

    摘要翻译: 新型可光聚合组合物包含烯键式不饱和单体,其是对羟基或间羟基或氨基苯甲酸的双丙烯酰基衍生物,成膜羧化聚合物粘合剂和可光活化聚合引发剂。 这些组合物易于用碱性溶液显影,并且可用于制备抗蚀剂,印刷版和其它光机械图像。 已经发现甲基丙烯酸甲酯,丙烯酸乙酯和甲基丙烯酸的三元共聚物粘合剂分别以摩尔计以40-65%,20-45%和10-25%的比例存在,以产生特别清洁的显影特性的抗蚀剂组合物 其基本上不含微量残留物。

    Barrier layer for liquid crystal-containing elements
    3.
    发明授权
    Barrier layer for liquid crystal-containing elements 失效
    用于液体含晶元素的阻挡层

    公开(公告)号:US3795517A

    公开(公告)日:1974-03-05

    申请号:US3795517D

    申请日:1972-11-13

    申请人: EASTMAN KODAK CO

    发明人: SUTTON R

    IPC分类号: G02F1/135 G03G5/00

    CPC分类号: G02F1/135 G02F2001/1351

    摘要: AN IMPROVED BARRIER LAYER CONTAINING A POLYMERIZED BLEND OF AT LEAST 50 MOLE PERCENT OF ONE OR MORE A,BETHYLENICALLY UNSATURATED AMIDES, 0 TO 50 MOLE PERCENT OF AN A,B-ETHYLENICALLY UNSATURATED SULFO ESTER, AND 0 TO 10 MOLE PERCENT OF A CROSSLINKABLE MONOMER IS DISCLOSED FOR USE IN AN ELECTRO-OPTICAL ELEMENT CONTAINING A PHOTOCONDUCTIVE LAYER, A LIQUID CRYSTAL FILM, AND THE BARRIER LAYER SANDWICHED THEREBETWEEN.