公开(公告)号：US20240337929A1

公开(公告)日：2024-10-10

申请号：US18744513

申请日：2024-06-14

申请人： DONGJIN SEMICHEM CO., LTD.

发明人： Jaehyun KIM ,  Myoung Hyun HUR ,  Jeong Sik KIM ,  Min Ja YOO ,  Hyung Kun LEE ,  Chanhyuk JI ,  Gyeonghun JANG ,  Jeongmin HA

IPC分类号： G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0048

摘要： A photoacid generator including an anion having a novel structure having a specific polar functional group such as a sulfonate group is provided. A photoresist composition comprising the same and a method for forming a photoresist pattern are also provided.

公开(公告)号：US20240337930A1

公开(公告)日：2024-10-10

申请号：US18744517

申请日：2024-06-14

申请人： DONGJIN SEMICHEM CO., LTD.

发明人： Jaehyun KIM ,  Myoung Hyun HUR ,  Jeong Sik KIM ,  Min Ja YOO ,  Hyung Kun LEE

IPC分类号： G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0048

摘要： A salt compound includes an anion having a specific structure represented by Chemical Formula 1, and a cation represented by Chemical Formula 2. A quencher includes the salt compound; and a photoresist composition includes the salt compound.