专利检索 ap:("DONGJIN SEMICHEM CO., LTD.") AND inv:"Chanhyuk JI" 第 1 页

1.

发明公开
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN USING THE SAME 审中-公开

公开(公告)号：US20240337929A1

公开(公告)日：2024-10-10

申请号：US18744513

申请日：2024-06-14

申请人： DONGJIN SEMICHEM CO., LTD.

发明人： Jaehyun KIM , Myoung Hyun HUR , Jeong Sik KIM , Min Ja YOO , Hyung Kun LEE , Chanhyuk JI , Gyeonghun JANG , Jeongmin HA

IPC分类号： G03F7/004

CPC分类号： G03F7/0045 , G03F7/0048

摘要： A photoacid generator including an anion having a novel structure having a specific polar functional group such as a sulfonate group is provided. A photoresist composition comprising the same and a method for forming a photoresist pattern are also provided.