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公开(公告)号:US20170088777A1
公开(公告)日:2017-03-30
申请号:US15316022
申请日:2015-05-26
申请人: DIC CORPORATION
发明人: Hiroshi Hasebe , Fumiaki Kodera , Masanao Takashima , Isa Nishiyama , Hiroyuki Itou , Yutaka Kadomoto , Kazuki Obi , Yoshitaka Saitou , Yuuichirou Tani , Keisuke Fujisawa
IPC分类号: C09K19/56 , G02F1/1337 , C08F20/36
CPC分类号: C09K19/56 , C08F20/30 , C08F20/36 , C08F20/58 , C08F20/60 , C08F22/40 , C09K19/601 , C09K2019/0448 , G02F1/1337 , G02F1/133711 , G02F1/133788
摘要: An object of the present invention is to provide a photoalignment layer with a more reliable absorption anisotropy parameter as a photoalignment layer that allows for reduced AC image-sticking. Specifically, provided is a photoalignment layer, obtained by exposure to polarized UV radiation, that has a maximum ΔA (=A1−A2, where A1 is the absorbance in a direction parallel to a vibration direction of the polarized UV radiation, and A2 is the absorbance in a direction parallel to the vibration direction of the polarized UV radiation) of 0.35 or more per micrometer of layer thickness in a range of 230 to 380 nm.
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公开(公告)号:US09708535B2
公开(公告)日:2017-07-18
申请号:US15316022
申请日:2015-05-26
申请人: DIC CORPORATION
发明人: Hiroshi Hasebe , Fumiaki Kodera , Masanao Takashima , Isa Nishiyama , Hiroyuki Itou , Yutaka Kadomoto , Kazuki Obi , Yoshitaka Saitou , Yuuichirou Tani , Keisuke Fujisawa
CPC分类号: C09K19/56 , C08F20/30 , C08F20/36 , C08F20/58 , C08F20/60 , C08F22/40 , C09K19/601 , C09K2019/0448 , G02F1/1337 , G02F1/133711 , G02F1/133788
摘要: An object of the present invention is to provide a photoalignment layer with a more reliable absorption anisotropy parameter as a photoalignment layer that allows for reduced AC image-sticking. Specifically, provided is a photoalignment layer, obtained by exposure to polarized UV radiation, that has a maximum ΔA (=A1−A2, where A1 is the absorbance in a direction parallel to a vibration direction of the polarized UV radiation, and A2 is the absorbance in a direction parallel to the vibration direction of the polarized UV radiation) of 0.35 or more per micrometer of layer thickness in a range of 230 to 380 nm.
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